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Polyester resin composition

A technology of polyester resin and composition, which is applied in the field of polyester resin composition, and can solve problems such as exudation, low solubility, and precipitation of ultraviolet absorbers

Active Publication Date: 2012-10-03
FUJIFILM CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, when the ultraviolet absorber is mixed with a resin or the like and coated, the film thickness is generally limited to several tens of μm at the most
When such a film thickness is used to block light in the long-wave region, it is necessary to add a relatively high concentration of ultraviolet absorbers, but only a high concentration of additions faces such a problem that in the course of long-term use, the ultraviolet absorber will be damaged. precipitation or exudation
High concentrations can also cause odor problems
In addition, many benzophenone-based or benzotriazole-based UV absorbers have low solubility, so it is difficult to mix and apply them in high concentrations with resins, etc.

Method used

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  • Polyester resin composition
  • Polyester resin composition
  • Polyester resin composition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment approach

[0080] A second preferred embodiment includes that embodiment wherein R 1a , R 1c and R 1e each represent a hydrogen atom, and R 1b and R 1d Each independently represents a hydrogen atom or a substituent having a positive Hammett's σp value, and at least one of them is a substituent having a positive Hammett's σp value.

[0081] In the second embodiment (where R 1a , R 1c and R 1e each represent a hydrogen atom, and R 1b and R 1d Each independently represents a hydrogen atom or a substituent with a positive Hammett σp value, and at least one of them is a substituent with a positive Hammett σp value), the Hammett σp value in formula (1) is Positive valued substituents are preferably COOR r 、CONR s 2 , CN, CF 3 , Halogen atom, NO 2 , or SO 3 M [where R r and R s Each independently represents a hydrogen atom or a monovalent substituent, and M represents a hydrogen atom or an alkali metal]. The monovalent substituent R r and R s Examples of include the substitue...

Synthetic example 1

[0246] Synthesis example 1 (preparation of compound (2))

[0247]

[0248] (Synthesis of X-2)

[0249] 39.5g (1.1 molar equivalents) of acetone oxime, 600mL of DMF (N,N-dimethylformamide) and 60.6g (1.1 molar equivalents) of potassium tert-butoxide were charged into a three-necked flask, and the The resulting mixture was stirred for 30 minutes. Then the internal temperature of the flask was set to 0° C. and 60 g (1.0 molar equivalent) of compound (X-1) was slowly added dropwise thereto. After the dropwise addition was completed, the internal temperature of the flask was raised to 25° C., and the resulting mixture was stirred at this temperature for 1 hour.

[0250] The obtained reaction mixture was subjected to an extraction / separation operation with aqueous ammonium chloride solution and ethyl acetate, and the obtained organic phase was washed by adding saturated brine, followed by separation. The organic phase thus obtained was concentrated in a rotary evaporator to obta...

Synthetic example 2

[0263] (Preparation of compound (m-2))

[0264] Acetonitrile (600 mL) and 355.2 g of DBU were added to 160.0 g of salicylamide and allowed to dissolve. To this solution, 193.2 g of 3-cyanobenzoyl chloride was added, and the mixture was stirred at room temperature for 24 hours. To the resulting reaction solution, 1,200 mL of water and 150 mL of hydrochloric acid were added, and the resulting solid was filtered out and washed with water to obtain 296.0 g of an intermediate synthesis product M (yield: 95%).

[0265] (intermediate synthesis product M)

[0266] Acetonitrile (1,200 mL) and 110.5 g of sulfuric acid were added to 200.0 g of the intermediate synthesis product M, and the mixture was stirred at 90° C. for 4 hours. To the resulting reaction solution, 600 mL of triethylamine was added, and the resulting mixture was cooled to room temperature. The resulting solid was filtered out and washed with water to obtain 177.3 g of an intermediate synthesis product N (yield: 95%...

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Abstract

Disclosed is a polyester resin composition which maintains long wave ultraviolet shielding effect for a long period of time, while having high solubility in a solvent and excellent light resistance. Specifically disclosed is a polyester resin composition which is characterized by containing a compound represented by general formula (1) and a polyester resin. (In general formula (1), R1a, R1b, R1c, R1d and R1e each independently represents a monovalent substituent other than a hydrogen atom and an OH group, with at least one of the substituents being a substituent that has a positive Hammett substituent constant (sigma p), and the substituents may combine together to form a ring; and R1g, R1h, R1i, R1j, R1k, R1m, R1n and R1p each independently represents a hydrogen atom or a monovalent substituent, and the substituents may combine together to form a ring.).

Description

technical field [0001] The present invention relates to a polyester resin composition containing a triazine compound and a polyester resin, and a molded article produced using the composition. Background technique [0002] Conventionally, ultraviolet absorbing properties have been provided by combining ultraviolet absorbers with various resins and the like. An inorganic ultraviolet absorber or an organic ultraviolet absorber is used as the ultraviolet absorber. In the case of using an inorganic ultraviolet absorber (for example, see Patent Documents 1 to 3), its durability such as weather resistance and heat resistance is excellent, but since the absorption wavelength is determined by the band gap of the compound, There is therefore less freedom of choice, leading to the fact that no absorber is known that also absorbs light in the long-wave ultraviolet (UV-A) region at about 400 nm, and absorbs light in the long-wave ultraviolet (UV-A) region Absorbents also absorb visibl...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08L67/00C08J5/18C08K5/3492D01F6/92H01L31/042
CPCC08J5/18D01F1/106C08L67/02C08K5/3492Y02E10/50H01L31/048C08J2367/00D01F6/62C08K5/3477H01L31/02013H01L31/049C08L101/00Y02E10/549C08L67/00
Inventor 渡边雪绘尼崎一路木村桂三永井洋一
Owner FUJIFILM CORP
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