Method for preparing zinc oxide nano wire/pipe arrays with controllable diameters and heights on indium tin oxide (ITO) glass
A technology of zinc oxide nanowires and nanowire arrays, applied in the field of zinc oxide nanowire/tube arrays, can solve the problems of complex precursor reactants, low crystallinity, and easy pollution of products, and achieve short preparation time and simple operation , high yield effect
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Embodiment 1
[0040] followed by trichlorethylene (C 2 HCl 3 ), acetone (CH 3 COCH 3 ), isopropanol (CH 3 CH(OH)CH) ultrasonic heating (70 ℃) cleaning ITO glass substrate for 15min, then rinse with ultrapure water and blow dry with nitrogen. 0.1M zinc acetate and 0.02M acetic acid were sequentially dissolved in a mixture of ethanol and distilled water (1:3, v / v), mixed evenly, and prepared as a seed layer precursor solution. Place the clean ITO glass on an electric heating plate, and when the heating temperature reaches 350°C, start to spray the misty seed layer precursor solution for 2 minutes to obtain a ZnO seed layer with a thickness of 20nm. Put the sample into a tube furnace and heat treatment at 350°C for 60min to make a ZnO seed layer film. Will 5x10 -4 M ZnCl 2Prepare ZnO electrodeposition solution with 1M KCl, and pass oxygen through the solution for 10 minutes at a constant temperature of 80°C. During the electrodeposition process, the solution was always bubbled with oxy...
Embodiment 2
[0042] followed by trichlorethylene (C 2 HCl 3 ), acetone (CH 3 COCH 3 ), isopropanol (CH 3 The ITO glass substrate was cleaned by ultrasonic heating (80°C) in CH(OH)CH) solvent for 10 min, rinsed with ultrapure water, and dried with nitrogen. 0.1M zinc acetate and 0.02M acetic acid were sequentially dissolved in a mixture of ethanol and distilled water (1:3v / v), mixed evenly, and prepared as a seed layer precursor solution. Place the clean ITO glass on an electric heating plate, heat the temperature to 400°C, and start spraying the precursor solution of the misty seed layer for 5 minutes to obtain a ZnO seed layer with a thickness of 50nm. Put the ZnO seed layer into a tube furnace, heat treatment at 400°C for 45min, and make a ZnO seed layer thin film. Will 5x10 -4 M ZnCl 2 After mixing with 3.4M KCl solution, it is formulated as a ZnO electrodeposition solution, and the solution is passed through oxygen for 15 minutes at a constant temperature of 70°C. During the el...
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