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Micro-nano structured D-shaped optical fiber, method for producing same and application

A micro-nano structure and optical fiber technology, applied in the field of optoelectronics, can solve the problems of complex mask manufacturing process, difficult to realize complex pattern preparation, high cost, and achieve good repeatability, simple and efficient preparation scheme, and guarantee resolution and transfer accuracy. Effect

Active Publication Date: 2012-11-07
NANJING UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The disadvantage of this method is that it is only suitable for periodic structures, it is difficult to realize the preparation of complex patterns, and the mask manufacturing process is complicated and expensive
This method can realize the preparation of arbitrary patterns, but requires a complex focusing optical system and precise displacement equipment, which is costly and inefficient

Method used

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  • Micro-nano structured D-shaped optical fiber, method for producing same and application
  • Micro-nano structured D-shaped optical fiber, method for producing same and application
  • Micro-nano structured D-shaped optical fiber, method for producing same and application

Examples

Experimental program
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Effect test

Embodiment 1

[0035] On the quartz substrate, a regular concave-convex pattern (a period of 2.5um, a two-dimensional ball array with a diameter of 1um, and a depth of 300nm) was constructed by photolithography. Reactive ion etching transferred the structure to the substrate, and oxygen plasma was applied to the surface of the quartz structure. Body treatment (etching 5s), followed by anti-sticking treatment. Add supporting fixtures on both sides of the D-shaped optical fiber, and make it flat with the plane of the D-shaped optical fiber, and then spin-coat a layer of UV-curable adhesive (mr-NIL6000 from Micro resist company, rotating speed 3000r / min, time 1min, Thickness about 500nm). Press the structured side of the quartz template down onto the plane of the D-shaped optical fiber, apply a pressure of 15 bar under nitrogen protection, keep it for 60 seconds, and then turn on the UV lamp at a rate of 50 mW / cm 2 Irradiate with high power for 5 minutes to fully cure the UV glue. After remov...

Embodiment 2

[0038] On the silicon nitride substrate template, a regular concave-convex pattern (a two-dimensional grid array with a period of 7um, a line width of 500nm, and a depth of 200nm) was constructed by photolithography. Reactive ion etching transferred the structure to the substrate, and the surface of the substrate was After treatment (oxygen plasma etching for 5s), anti-sticking treatment is performed. Then PDMS (Silicone elastomer KIT 184, Daw corning, KIT 184 silicone rubber, Dow Corning Company) was spin-coated on the substrate with the structure carved (spin-coating speed 600r / min, time 12s, film thickness about 300nm), vacuum degassing After 30min, it was cured at 60°C for 5h. Lightly brush a layer of UV curing glue (OG154 UV glue from EPO-TEK company, thickness about 400nm) on the plane of the D-shaped optical fiber, peel off the cured PDMS from the silicon nitride substrate, with the structured side facing down , attached to the D-shaped optical fiber plane, so that the...

Embodiment 3

[0041] A layer of polymethyl methacrylate PMMA (thickness about 500nm) was spin-coated on the single crystal silicon substrate template, and a regular concave-convex pattern (period 700nm, line width 350nm) was constructed by E-beam lithography One-dimensional grating array, depth 300nm), reactive ion etching to transfer the structure to the substrate, after surface treatment of the substrate (oxygen plasma etching for 5s), anti-sticking treatment. Then PDMS was spin-coated on the substrate with the structure (spin-coating speed 600r / min, film thickness about 300nm), vacuum degassed for 30min and cured at 60°C for 5h. Lightly brush a layer of PMMA on the D-shaped optical fiber plane, peel off the cured PDMS from the single crystal silicon substrate, and stick it on the D-shaped optical fiber plane with the structured side facing down. ) to make the two fully contact, raise the temperature to 160°C and keep it for 6min, then start to cool down to 80°C, remove the PDMS, and reac...

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Abstract

A micro-nano structured D-shaped optical fiber has a cross section which has a shape of a letter D, i.e. one side of the optical fiber is a round surface, the other side of the optical fiber is a plane or is similar to the plane, the distance (radius r) from a fiber core to the round side of the optical fiber is 50-200 micrometers, and the distance d from the plane to the fiber core is 5-15 micrometers; a concave-convex pattern structure is formed on the D plane, and is a one-dimensional array or a two-dimensional grid array which has a period of 0.2-15mu.m, the line width of 100-1000nm and the depth of 100-400nm; and the plane side of the optical fiber has a strong evanescent field, and is easily regulated by surface structure characteristics and material properties. A method for producing a micro-nano structure on the surface of the D-shaped optical fiber is specifically that a nanoimprint technology is utilized to transfer a template structure onto the plane of the D-shaped optical fiber, through the mutual action of the transferred micro-nano structure and the evanescent field of the D-shaped optical fiber plane, the light which is transmitted in the optical fiber can be regulated, and furthermore, the functions of light sensing, light regulating and the like are realized.

Description

technical field [0001] The invention relates to the field of optoelectronic technology, in particular to a preparation process and application of a novel micro-nano structured D-shaped optical fiber. The invention proposes the preparation process and parameter control of transferring the micro-nano structure on the template to the plane of the D-shaped optical fiber through nanoimprinting, and specifically applies the D-shaped optical fiber to the fields of sensing, communication, and integrated optics. Background technique [0002] Periodically modulated refractive index structures have attracted more and more attention in the fields of optical communication and sensing in recent years. They can form Bragg forbidden bands related to the changing period and play a reflection role in the transmission of light waves. As early as half a century ago, physicists have known that electrons in crystals (such as semiconductors) are scattered by the periodic potential of the crystal ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B6/02G02B6/024C03C25/12
Inventor 陆延青林晓雯李苏陕钱小石葛海雄胡伟徐飞
Owner NANJING UNIV
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