Amorphous carbon film with graphene structure and preparation method thereof

Abstract

The invention provides an amporphous carbon film with a novel special structure, wherein the amporphous carbon film is divided into an upper layer and a lower layer; an amporphous carbon film is arranged at the lower layer; the upper layer is located on the surface of the lower layer and is a multilayer graphene structure thin film which is about 0.5-10nm thick; and a brand new thought is proposed for the preparation of grapheme. A magnetron sputtering sedimentation method such as high-power pulse magnetron sputtering sedimentation or common direct-current magnetron sputtering sedimentation is used; high-purity graphite is used as a target material; and through adjusting parameters of a substrate, such as negative bias and pulse magnetron sputtering voltage, sputtering sedimentation is carried out on the substrate for 0.5-180min in an inert gas shielding atmosphere so as to obtain the amporphous carbon film with multilayer graphene structure on the surface. Compared with the existing graphene preparation technologies, the preparation method of the amporphous carbon film with the novel special structure has the advantages that large-area graphene can be simply and efficiently prepared, the process is environment-friendly the requirement on the substrate is lower, no catalyst is needed, the sedimentation is carried out at a low temperature and the cost is low, so that important potential research and application values are provided.

Description

technical field [0001] The invention relates to the technical field of vacuum coating surface, in particular to a method for preparing an amorphous carbon film with a graphene structure by magnetron sputtering. Background technique [0002] In 2004, Geim et al. from the University of Manchester obtained single-layer and 2-3-layer graphene materials by means of micromechanical exfoliation, which overturned the theoretical prediction that "a perfect two-dimensional crystal structure cannot exist stably at non-absolute zero." Graphene is a two-dimensional honeycomb lattice structure formed by a single layer of carbon atoms tightly packed, which consists of hexagonal lattices. Two-dimensional graphene carbon-based crystals are formed by sp 2 The basic unit of hybrid carbonaceous materials, which can be stacked longitudinally to form bulk graphite, rolled into cylindrical carbon nanotubes, and wrapped to form fullerenes. Because of its unique two-dimensional structure and excel...

AI Technical Summary

Problems solved by technology

Among them, due to the low deposition temperature of the physical vapor deposition method, the deposited films are generally amorphous structures, so those skilled in the art generally believe that it is difficult to use this method to prepare graphene structures, so there is no such method so far. Any relevant reports on the preparation of graphene by physical vapor deposition

The chemical vapor deposition method is considered to be one of the most promising methods to prepare large-size, high-quality graphene, which is compatible with the existing semiconductor manufacturing process, but the method requires high preparation temperature, catalyst conditions, and the substrate In addition, because the electronic properties of graphene are greatly affected by the substrate, the quantum Hall effect has not been observed in the graphene prepared by this method.

Images