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Stripping liquid for plasma display screen as well as preparation method and application of stripping liquid

The technology of stripping solution and deionized water is applied in the field of plasma display stripping solution and its preparation and application. Corrosive effect

Active Publication Date: 2014-07-30
江苏荣圣汽车零部件有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Yet these existing stripping liquids have the following problems: 1, the production process is complicated
During the stripping process, after stripping off the photoresist, it needs to be rinsed with organic solvent and water respectively, which increases the cleaning process time and produces a large amount of waste liquid and wastewater; 2. The stripping performance is weak and has a great impact on wiring corrosion; 3. The amount of residual metal ions after cleaning exceeds the standard requirements, which is likely to cause surface metal ion pollution

Method used

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  • Stripping liquid for plasma display screen as well as preparation method and application of stripping liquid
  • Stripping liquid for plasma display screen as well as preparation method and application of stripping liquid
  • Stripping liquid for plasma display screen as well as preparation method and application of stripping liquid

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0068] Trimethylallyl ammonium hydroxide (AM1) 5 grams, amide compound 6-fluoro-3-oxo-3,4-hydropyrazine-2-carboxamide (PCA) 2 grams; glycol ethers 15 grams of water-soluble organic solvent propylene glycol (PG), 0.5 grams of preservative sorbitol (SRB) and 77.5 grams of deionized water were mixed at room temperature by stirring and oscillating to obtain the plasma display screen stripping solution provided by the present invention.

[0069] According to the exact same steps as in Example 1 above, only the names and dosages of the components used are replaced as shown in Table 1 to obtain Examples 2-5. Exactly the same steps, the components of different mass percentages were selected for comparison, and the names and amounts of each component were also listed in Table 1. The peeling effect is as follows figure 1 shown.

[0070] Table 1, the composition list of the stripping solution

[0071]

[0072] Note:

[0073] AM1: Trimethylallyl Ammonium Hydroxide

[0074] AM2: Tr...

Embodiment 6

[0086] Trimethylallyl ammonium hydroxide (AM1) 5 grams, amide compound 6-fluoro-3-oxo-3,4-dihydropyrazine-2-carboxamide (PCA) 5 grams; glycol ether 10 grams of water-soluble organic solvent propylene glycol (PG), 0.5 grams of preservative sorbitol (SRB) and 79.5 grams of deionized water were mixed at room temperature by stirring and shaking to obtain the plasma display stripping liquid provided by the present invention.

[0087] According to the exact same steps as in Example 6 above, only the names and amounts of the components used are replaced as shown in Table 3 to obtain Examples 7-10. Exactly the same steps, the components of different mass percentages are selected for comparison, and the names and amounts of each component are also listed in Table 3.

[0088] Table 3. List of stripping liquid composition

[0089]

[0090]

[0091] Note:

[0092] AM1: Trimethylallyl Ammonium Hydroxide

[0093] AM2: Triethylallyl Ammonium Hydroxide

[0094] AM3: Tripropylallyl A...

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PUM

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Abstract

The invention discloses stripping liquid for a plasma display screen as well as a preparation method and an application of the stripping liquid. The stripping liquid comprises quaternary ammonium hydroxide, acid amide compound, dihydric alcohol solution, antiseptic and de-ionized water. The stripping liquid can rapidly and completely strip off photoresist and has a low corrosion effect on wiring materials and the like. Even if the photoresist is rinsed with water after being stripped off, insoluble substances can be prevented from settling, and the stripping liquid has high safety for environment and human body. For the photoresist deteriorated in a wet etching procedure, the stripping liquid can effectively strip off and remove a pattern of the photoresist, so that the stripping liquid has very low corrosivity for inorganic materials such as metallic films and oxide films forming a plasma panel, and has a significant application value.

Description

technical field [0001] The invention relates to a plasma display stripping solution, a preparation method and application thereof. Background technique [0002] In the photolithography technology for the production of plasma substrates, it is usually carried out sequentially on the glass substrate: the metal wiring formation process of setting the metal or metal oxide layer; the process of setting the photoresist layer; on the photoresist An exposure process for transferring a mask pattern; an etching process for etching a pattern according to a pattern; and a lift-off process for removing a photoresist. In the usual manufacturing process, there will be as many as ten photolithography processes. [0003] General stripping liquid can enumerate inorganic acid, organic acid, inorganic base or organic solvent, but, as the active ingredient of stripping agent, when using inorganic acid or inorganic base, or make lower metal film corrode, or be accompanied by harmful to human bod...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/42
Inventor 冯卫文
Owner 江苏荣圣汽车零部件有限公司
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