Flexible substrate nanometer diamond film and preparation method thereof

A nano-diamond and flexible substrate technology, applied in the field of polishing and abrasive materials, can solve the problems of complex production and preparation process, low bonding force between the diamond film and the substrate, etc., and achieves improved nucleation rate, strong controllability and versatility , easy to achieve effect

Inactive Publication Date: 2013-03-13
ZHENGZHOU UNIV
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Problems solved by technology

However, the bonding force between the diamond film prepared by vapor deposition method and the substrate is low, which has always been a bottleneck limiting the application of diamond film
[0003] Patent document CN 102634793A discloses a flexible substrate nano-diamond film composed of a metal flexible substrate layer, a transition

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  • Flexible substrate nanometer diamond film and preparation method thereof
  • Flexible substrate nanometer diamond film and preparation method thereof
  • Flexible substrate nanometer diamond film and preparation method thereof

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Embodiment 1

[0025] Embodiment 1 A kind of preparation method of flexible substrate nano-diamond film:

[0026] (1) Substrate copper foil (10×10×0.2mm) is surface treated, and the treatment process is: polishing → ultrasonic cleaning in acetone solution for 10 minutes → deionized water cleaning for 5 minutes → soaking in 10% dilute sulfuric acid for 10 hours → acetone solution Ultrasonic cleaning for 10 minutes → deionized water cleaning for 2 minutes;

[0027] (2) Preparation of transition layer: C-S magnetron sputtering was used for the preparation of Ni transition layer. The specific conditions for sputtering deposition were as follows: sputtering current 0.9A, sputtering temperature 310°C, sputtering deposition time 18min, Ar gas flow 38sccm, during the entire sputtering process, the sample holder rotates continuously to make the film layer uniform;

[0028] (3) The sample obtained in step 2 was ultrasonically cleaned with diamond micropowder acetone solution for 10 minutes, ultrasoni...

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Abstract

The invention relates to a flexible substrate nanometer diamond film and a preparation method thereof. The flexible substrate nanometer diamond film comprises a metal flexible substrate layer, a Ni transition layer, a diamond film layer and a nanometer diamond film layer. According to the preparation method, Ni is used as the transition layer, and the diamond film and the nanometer diamond film are prepared by a microwave plasma chemical vapor deposition (MPCVD) method, so that the adhesive force is enhanced, and the adhesive force of the film base is further enhanced by regulating the following key processing steps: (1) carrying out hydrogen treatment on the Ni transition layer to enhance the binding force between the transition layer Ni and the substrate and etch redundant Ni; (2) depositing the diamond film at high methane concentration to improve the nucleation rate of the subsequent nanometer diamond film; (3) depositing the nanometer diamond film at low methane concentration with Ar gas introduced; and (4) insulating and annealing. The flexible substrate nanometer diamond film is low in surface roughness and smooth in surface, and can be used for substituting polishing powder, so that the shortage of the conventional polishing process is effectively overcome, and the application range is widened. The preparation method is simple and easy to realize, and has high controllability and generality.

Description

technical field [0001] The invention relates to a polishing abrasive material, in particular to a flexible substrate nano-diamond film and a preparation method thereof. Background technique [0002] The diamond film has excellent polishing performance, while the nano-diamond film has a smoother surface and a lower friction coefficient, the friction coefficient can be less than 0.05, and the microhardness measured by the nanomechanical probe is as high as 8000kg / mm 2 , almost called "never wear", so nano-diamond films have been widely used in the fields of electronics, friction and wear, micro-electromechanical systems (MEMS), field emission, optics, and electrochemistry. In recent years, with the development of optical technology, the requirements for polishing the surface of precision optical glass are getting higher and higher, while the traditional polishing process uses polishing powder for polishing, mainly rare earth polishing powder, which can be divided into three c...

Claims

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Application Information

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IPC IPC(8): C23C28/00C23C14/35C23C14/16C23C16/44C23C16/27C23C16/56
Inventor 史新伟李杏瑞王晓霞姚宁张兵林周秋霞靳慧智
Owner ZHENGZHOU UNIV
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