Preparation method of surface print adsorbent of yeast template hollow silica-based material for adsorbing and separating strontium ions and application thereof

A silicon-based material, surface imprinting technology, applied in chemical instruments and methods, adsorption water/sewage treatment, other chemical processes, etc., to achieve good mechanical properties and thermal stability, avoid incomplete elution, and high mechanical strength.

Inactive Publication Date: 2013-04-24
JIANGSU UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Using yeast as a template to prepare hollow silicon-based materials and introducing surface imprinting technology to obtain surface imprinted adsorbents for yeast-templated hollow silicon-based materials has not been reported yet.

Method used

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  • Preparation method of surface print adsorbent of yeast template hollow silica-based material for adsorbing and separating strontium ions and application thereof
  • Preparation method of surface print adsorbent of yeast template hollow silica-based material for adsorbing and separating strontium ions and application thereof
  • Preparation method of surface print adsorbent of yeast template hollow silica-based material for adsorbing and separating strontium ions and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0042] (1) Preparation of yeast / silicon complex (SiY)

[0043] The modified Stäber method was used to directly coat silica on the surface of yeast cells to prepare yeast / silicon composite materials. The specific preparation process was as follows: 15 g of dry yeast was weighed and dissolved in 60 mL of 0.9% NaCl solution 4.0 mL of yeast suspension was pipetted, 4.0 mL of deionized water was added, and stirred rapidly for 10 min; 16 mL of absolute ethanol was added, and the mixture was sonicated for 20 min to make the cells uniform Disperse; add 0.75 mL concentrated ammonia water and 2.0 mL tetraethyl orthosilicate (TEOS), and age for 5.0 h with magnetic stirring at room temperature; collect the product by filtration, wash the product three times with deionized water, and fully dry it at room temperature The product is fully ground with a mortar, passed through a 100-mesh sieve, and set aside.

[0044] (2) Preparation of yeast template hollow silicon-based material (SSiY)

[...

Embodiment 2

[0050] (1) Preparation of yeast / silicon complex (SiY)

[0051] The modified Stäber method was used to directly coat silica on the surface of yeast cells to prepare yeast / silicon composite materials. The specific preparation process was as follows: 15 g of dry yeast was weighed and dissolved in 55 mL of 0.8% NaCl solution 3.5 mL of yeast suspension was pipetted, 3.5 mL of deionized water was added, and stirred rapidly for 8 min; 14 mL of absolute ethanol was added, and the mixture was sonicated for 15 min to make the cells uniform Disperse; add 0.65 mL of concentrated ammonia water and 1.5 mL of tetraethyl orthosilicate (TEOS), and age for 5.0 h with magnetic stirring at room temperature; collect the product by filtration, wash the product with deionized water three times, and fully dry it at room temperature The product is fully ground with a mortar, passed through a 100-mesh sieve, and set aside.

[0052] (2) Preparation of yeast template hollow silicon-based material (SSiY)...

Embodiment 3

[0058] (1) Preparation of yeast / silicon complex (SiY)

[0059] The modified Stäber method was used to directly coat silica on the surface of yeast cells to prepare yeast / silicon composite materials. The specific preparation process was as follows: 15 g of dry yeast was weighed and dissolved in 65 mL of 1.0% NaCl solution 4.5 mL of yeast suspension was obtained by pipetting 4.5 mL of yeast suspension, adding 4.5 mL of deionized water, and stirring rapidly for 12 min; adding 18 mL of absolute ethanol, and ultrasonicating the mixture for 25 min to make the cells uniform Disperse; add 0.75 mL of concentrated ammonia water and 2.0 mL of tetraethyl orthosilicate (TEOS), and age for 6.0 h with magnetic stirring at room temperature; collect the product by filtration, wash the product with deionized water three times, and fully dry it at room temperature The product is fully ground with a mortar, passed through a 100-mesh sieve, and set aside.

[0060] (2) Preparation of yeast templat...

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Abstract

The invention belongs to the technical field of environmental material preparation and relates to a preparation method of surface print adsorbent of yeast template hollow silica-based material for adsorbing and separating strontium ions and application thereof. The technical scheme of preparation includes coating a yeast template surface with nanosilica particles to obtain yeast / silicon compound, removing yeast template to prepare yeast template hollow silica-based material through calcinations, using yeast template hollow silica-based material as a host material, divalent strontium ions as template ions, chitosan as functional monomer and gamma-(2,3glycidoxyprop) trimethoxypropylsilane as cross-linking agent and performing ionic imprinting polymeric modification by using suspension polymerization. The prepared adsorbent has the advantages of good mechanical property and heat stability, higher adsorption capacity and adsorption dynamics performance, low cost and large specific surface area and avoids the defects such as halfway elution and irregular microballoon shape due to too deep embedding of some template molecules to achieve the purpose of quickly, selectively and effectively adsorbing and separating divalent strontium ions.

Description

technical field [0001] The invention belongs to the technical field of environmental material preparation, and relates to a yeast template hollow silicon-based material surface imprinted adsorbent, in particular to a preparation method and application of a yeast template hollow silicon-based material surface imprinted adsorbent for absorbing and separating strontium ions. Background technique [0002] Molecular imprinting technology uses target molecules (or ions) as templates to form complexes with structurally complementary functional monomers through reversible covalent or non-covalent bonds, and adds cross-linking agents for polymerization reactions. After the reaction is completed, the template molecules It is eluted from the polymer to form a polymer material with specific recognition for template molecules. Surface imprinting technology is a new technology for preparing polymers with molecular (ion) recognition ability. It solves some serious defects of traditional im...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J20/26B01J20/30C02F1/28C02F1/62C08J9/26
Inventor 欧红香宋玉君潘建明黄卫红毛艳丽闫永胜
Owner JIANGSU UNIV
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