Silver nanocolumn array vertically at the hole of porous alumina template and its preparation method and application
A technology of porous alumina and alumina template, applied in the direction of ion implantation plating, coating, metal material coating process, etc., can solve the problems of high SERS performance, unfavorable target molecular adsorption and other problems, and achieve improved SERS Activity, improve the electromagnetic field enhancement, and facilitate the effect of effective adsorption
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Embodiment 1
[0029] The concrete steps of preparation are:
[0030] Step 1, first place the aluminum sheet in an oxalic acid solution with a temperature of 6°C and a concentration of 0.2mol / L, and anodize it at a DC voltage of 30V for 4h. Then soak it in a mixed solution of phosphochromic acid at 55° C. for 6 hours to obtain an intermediate product.
[0031] In step 2, the intermediate product is placed in an oxalic acid solution with a temperature of 6°C and a concentration of 0.2 mol / L, and anodized at a DC voltage of 30V for 60s. Then soak it in a phosphoric acid solution with a temperature of 30°C and a concentration of 3wt% for 10 minutes, repeat the above process 10 times, and obtain an alumina template with conical holes.
[0032] Step 3, place the aluminum oxide template with a tapered hole in the ion sputtering device so that the distance between it and the silver target in the ion sputtering device is 8 cm, the current during sputtering is 10 mA, and the time is 30 min. made ap...
Embodiment 2
[0034] The concrete steps of preparation are:
[0035] Step 1, first place the aluminum sheet in an oxalic acid solution with a temperature of 10°C and a concentration of 0.25mol / L, and anodize it at a DC voltage of 35V for 3.5h. Then soak it in a mixed solution of phosphochromic acid at 58° C. for 5 hours to obtain an intermediate product.
[0036] In step 2, the intermediate product is placed in an oxalic acid solution at a temperature of 10° C. and a concentration of 0.25 mol / L, and anodized at a DC voltage of 35 V for 50 seconds. Then soak it in a phosphoric acid solution with a temperature of 35°C and a concentration of 4wt% for 8 minutes, repeat the above process 13 times, and obtain an alumina template with conical holes.
[0037] Step 3, place the aluminum oxide template with a tapered hole in the ion sputtering device so that the distance between it and the silver target in the ion sputtering device is 9 cm, the current during sputtering is 18 mA, and the time is 26 ...
Embodiment 3
[0039] The concrete steps of preparation are:
[0040] Step 1, first place the aluminum sheet in an oxalic acid solution with a temperature of 15°C and a concentration of 0.3mol / L, and anodize it at a DC voltage of 40V for 3h. Then soak it in a mixed solution of phosphochromic acid at 60° C. for 4.5 hours to obtain an intermediate product.
[0041] In step 2, the intermediate product is placed in an oxalic acid solution with a temperature of 15° C. and a concentration of 0.3 mol / L, and anodized at a DC voltage of 40 V for 40 seconds. Then soak it in a phosphoric acid solution with a temperature of 40°C and a concentration of 6wt% for 6 minutes, repeat the above process 15 times, and obtain an alumina template with conical holes.
[0042] Step 3, place the aluminum oxide template with a tapered hole in the ion sputtering device so that the distance between it and the silver target in the ion sputtering device is 10 cm, the current during sputtering is 25 mA, and the time is 21...
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