Surface modification process for improving luminance and dispersity of porous silicon
Patent Information
- Authority / Receiving Office
- CN Β· China
- Current Assignee / Owner
- ZHEJIANG UNIV
- Publication Date
- 2013-09-11
- Estimated Expiration
- Not applicable Β· inactive patent
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Abstract
Description
technical field
[0001] The invention belongs to the field of porous silicon luminescence, and in particular relates to a surface modification process for enhancing the luminescence and dispersibility of porous silicon. Background technique
[0002] Since the discovery of the photoluminescence phenomenon of porous silicon at room temperature, researchers have carried out a lot of research work on the preparation and surface modification of porous silicon, mainly because porous silicon as a silicon-based luminescent material can be widely used in Photovoltaic technology, preparation of light-emitting diodes and photodetectors, and use as fluorescent markers, etc.
[0003] At present, the luminescence of porous silicon is mainly attributed to the quantum confinement effect and the surface of silicon particles.
[0004] The result of the combined effect of composition, a typical example is that with the oxidation of nanocrystalline particles in porous silicon, the size of nanoc...