Preparation method of titanium dioxide (TiO2) nanotube film on stainless steel surface
A stainless steel and nanotube technology, applied in surface reaction electrolytic coating, ion implantation plating, electrolytic coating, etc., can solve the problems of small specific surface area and high density
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Embodiment approach 1
[0014] (1) Put the 00Cr17Ni14Mo2 stainless steel substrate workpiece into a double-layer glow ion infiltration metal furnace, use a pure Ti plate as a sputtering target, and use argon as a working gas to infiltrate Ti. The process conditions for infiltration and plating of Ti are: the distance between the stainless steel workpiece and the sputtering target is 15 mm; the air pressure is 35 Pa; the sputtering target voltage is 1080 V; the stainless steel workpiece voltage is 520 V; the stainless steel workpiece temperature is 940 ℃; the infiltration time is 2 h.
[0015] (2) Use insulating glue to seal the surface of the stainless steel workpiece that is not infiltrated with Ti, and only expose the part coated with Ti film as the working surface. Then the stainless steel workpiece coated with Ti film was placed in 0.5 wt% HF electrolyte as anode, the Pt sheet was used as cathode, magnetic stirring was turned on, anodized at 25 V DC for 30 min at room temperature, and TiO was for...
Embodiment approach 2
[0018] (1) Put the 1Cr17 stainless steel substrate workpiece into a double-layer glow ion infiltration metal furnace, use a pure Ti plate as a sputtering target, and use argon as a working gas to infiltrate Ti. The process conditions for infiltration and plating of Ti are: the distance between the stainless steel workpiece and the sputtering target is 18 mm; the air pressure is 40 Pa; the sputtering target voltage is 1150 V; the stainless steel workpiece voltage is 580 V; the stainless steel workpiece temperature is 890 ℃; the infiltration time is 3 h.
[0019] (2) Use insulating glue to seal the surface of the stainless steel workpiece that is not infiltrated with Ti, and only expose the part coated with Ti film as the working surface. Then the stainless steel workpiece coated with Ti film was placed in 1.5 wt% HF electrolyte as anode, the Pt sheet was used as cathode, magnetic stirring was turned on, anodized at 20 V DC for 10 min at room temperature, and TiO was formed on th...
Embodiment approach 3
[0022](1) Put the 0Cr18Ni9 stainless steel substrate workpiece into a double-layer glow ion infiltration metal furnace, use a pure Ti plate as a sputtering target, and use argon as a working gas to infiltrate Ti. The process conditions for infiltration and plating of Ti are: the distance between the stainless steel workpiece and the sputtering target is 20 mm; the air pressure is 45 Pa; the sputtering target voltage is 1200 V; the stainless steel workpiece voltage is 580 V; the stainless steel workpiece temperature is 830 ℃; the infiltration time is 4 h.
[0023] (2) Use insulating glue to seal the surface of the stainless steel workpiece that is not infiltrated with Ti, and only expose the part coated with Ti film as the working surface. Then the stainless steel workpiece coated with Ti film was placed in 1.0 wt% HF electrolyte as anode, the Pt sheet was used as cathode, magnetic stirring was turned on, anodized at 20 V DC and room temperature for 20 min, and TiO was forme...
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Abstract
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