Preparation method of solar cell light absorption layer
A technology for solar cells and light absorbing layers, applied in coatings, circuits, electrical components, etc., can solve problems such as adverse effects on carrier mobility, increase in film defects, and small film grains
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Embodiment 1
[0061] At room temperature, the substrate coated with the molybdenum film layer was placed on the sample holder of the magnetron sputtering chamber, and the magnetron sputtering chamber was evacuated. Introduce argon gas into the magnetron sputtering chamber, turn on the heating power supply of the copper indium diselenide ternary alloy target, adjust the output heating power of the power supply to 100W, and close the baffle on the copper indium diselenide ternary alloy target, Perform pre-sputtering on the copper indium diselenide ternary alloy target for 5 minutes. Open the baffle above the copper indium diselenide ternary alloy target, and continue sputtering for 6 minutes to form a copper indium selenide thin film on the substrate. The copper indium selenide film is heated, and the temperature is gradually raised to 500° C. within 3 minutes, and maintained at 500° C. for 3 minutes, so that the copper indium selenide film is crystallized to form a copper indium selenide tra...
Embodiment 2
[0063] At room temperature, the substrate coated with the molybdenum film layer was placed on the sample holder of the magnetron sputtering chamber, and the magnetron sputtering chamber was evacuated. Introduce argon gas into the magnetron sputtering chamber, turn on the heating power supply of the copper indium diselenide ternary alloy target, adjust the output heating power of the power supply to 120W, and close the baffle on the copper indium diselenide ternary alloy target, Perform pre-sputtering on the copper indium diselenide ternary alloy target for 5 minutes. Open the baffle above the copper indium diselenide ternary alloy target, and continue sputtering for 8 minutes to form a copper indium selenide thin film on the substrate. The copper indium selenide film is heated, and the temperature is gradually raised to 500° C. within 3 minutes, and maintained at 500° C. for 5 minutes, so that the copper indium selenide film is crystallized to form a copper indium selenide tra...
Embodiment 3
[0065] At room temperature, the substrate coated with the molybdenum film layer was placed on the sample holder of the magnetron sputtering chamber, and the magnetron sputtering chamber was evacuated. Introduce argon gas into the magnetron sputtering chamber, turn on the heating power supply of the copper indium diselenide ternary alloy target, adjust the output heating power of the power supply to 120W, and close the baffle on the copper indium diselenide ternary alloy target, Perform pre-sputtering on the copper indium diselenide ternary alloy target for 5 minutes. Open the baffle above the copper indium diselenide ternary alloy target, and continue sputtering for 10 minutes to form a copper indium selenide thin film on the substrate. The copper indium selenide film is heated, and the temperature is gradually raised to 500° C. within 3 minutes, and maintained at 500° C. for 5 minutes, so that the copper indium selenide film is crystallized to form a copper indium selenide tr...
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