A Dispersion Modulation Method of Metal Thin Film Surface Based on Surface Plasmon Resonance
A technology of surface plasmon and metal thin film, applied in the direction of diffusing elements, etc., can solve the problem of high cost, achieve the effect of strong compatibility, easy acquisition cost, and low acquisition cost
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Embodiment 1
[0032] Quartz was selected as the substrate material, and the substrate was ultrasonically cleaned. The ultrasonic solutions were concentrated sulfuric acid, acetone, ethanol, and deionized water. The ultrasonic time was 15 minutes each. After cleaning, put it into a vacuum drying oven for drying. The cleaned substrate was placed in a magnetron sputtering apparatus, and the double targets of double-target co-sputtering were gold target and silver target respectively, and the sputtering time was 200s. Set the gold target current to 0.025A, the silver target current to 0.08A, and perform sputtering coating. The energy dispersive X-ray spectroscopy (EDX) test was carried out on the alloy film to obtain the composition information of the film. The composition percentage of gold and silver is Au:Ag=34%:66% (such as figure 2 (a)). Then the alloy film is combined with a prism (such as figure 1 ) placed in the optical path of the ellipsometer, the reflectance spectrum of the thin f...
Embodiment 2
[0034] Quartz was selected as the substrate material, and the substrate was ultrasonically cleaned. The ultrasonic solutions were concentrated sulfuric acid, acetone, ethanol, and deionized water. The ultrasonic time was 15 minutes each. After cleaning, put it into a vacuum drying oven for drying. The cleaned substrate was placed in a magnetron sputtering apparatus, and the double targets of double-target co-sputtering were gold target and silver target respectively, and the sputtering time was 200s. Set the gold target current to 0.06A, the silver target current to 0.06A, and perform sputtering coating. The energy dispersive X-ray spectroscopy (EDX) test is carried out on the alloy film to obtain the composition information of the film. The percentage of gold and silver composition is Au:Ag=55%:45% (such as figure 2 (c)). Then put the alloy thin film and prism in the optical path of the ellipsometer, measure the reflection spectrum of the thin film by changing the incident ...
Embodiment 3
[0036] Quartz was selected as the substrate material, and the substrate was ultrasonically cleaned. The ultrasonic solutions were concentrated sulfuric acid, acetone, ethanol, and deionized water. The ultrasonic time was 15 minutes each. After cleaning, put it into a vacuum drying oven for drying. The cleaned substrate was placed in a magnetron sputtering apparatus, and the double targets of double-target co-sputtering were gold target and silver target respectively, and the sputtering time was 200s. Set the gold target current to 0.075A, the silver target current to 0.06A, and perform sputtering coating. The energy dispersive X-ray spectroscopy (EDX) test is carried out on the alloy film to obtain the composition information of the film. The percentage of gold and silver composition is Au:Ag=75%:25% (such as figure 2 (e)). Then put the alloy thin film and prism in the optical path of the ellipsometer, measure the reflection spectrum of the thin film by changing the incident...
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