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Gallic acid base light curing active monomer, preparation method and application thereof

A technology of gallic acid and active monomers, applied in the field of bio-based polymer materials, can solve the problems of difficult to obtain performance photocurable coatings, flexible aliphatic chain length, low reactivity, etc. simple effect

Active Publication Date: 2013-12-25
NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the flexible fatty chain in the vegetable oil structure is long, the double bond density is small, and the reactivity is low. It is difficult to obtain a photocurable coating with good performance. In order to meet the actual use needs, other rigid structures must be introduced through chemical modification, or Adding a multifunctional crosslinking agent, its comprehensive performance mainly depends on the structure and amount of the introduced rigid compound or multifunctional crosslinking agent

Method used

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  • Gallic acid base light curing active monomer, preparation method and application thereof
  • Gallic acid base light curing active monomer, preparation method and application thereof
  • Gallic acid base light curing active monomer, preparation method and application thereof

Examples

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Effect test

Embodiment 1

[0031] Mix 100 parts by mass of gallic acid, 1500 parts by mass of acetone, 180 parts by mass of allyl chloride and 200 parts by mass of calcium oxide, react at 50°C for 48 hours, then add 250 parts by mass of acryloyl chloride, Continue to react for 48 hours, filter, wash with water, obtain final product after decompression distillation removes solvent, water etc., the product 1 HNMR spectrum as figure 1 as shown, figure 1 The appearance of 5.21-5.49ppm and 5.84-6.13ppm represents the H on the allyl double bond, and the peak at 6.11-6.65ppm represents the H on the acryloyl double bond, plus other peaks are related to the gallic acid-based photocurable active unit The H proton displacement of the body is consistent, proving that the obtained product is a gallic acid-based photocurable active monomer of the formula I structure; from the peak area corresponding to the H on the allyl double bond and the H on the acryloyl double bond, it can be calculated out n=1.7

[0032] ...

Embodiment 2

[0036] 100 mass parts of gallic acid, 1000 mass parts of methyl ethyl ketone, 400 mass parts of N,N'-dimethylformamide, 100 mass parts of allyl bromide and 200 mass parts of triethylamine were mixed at 20 ℃ for 12 hours, then add 400 parts by mass of acryloyl chloride, react at 40 ℃ for 24 hours, filter, wash with water, and distill under reduced pressure to remove solvent, water, etc. to obtain the final product. 1 The appearance of 5.21-5.49ppm and 5.84-6.13ppm in the HNMR spectrum represents the H on the allyl double bond, and the peak at 6.11-6.65ppm represents the H on the acryloyl double bond, plus other peaks and gallic acid group light The H proton displacement of the curing active monomer is consistent, proving that the obtained product is a gallic acid-based photocuring active monomer of the formula I structure; the peak area corresponding to the H on the allyl double bond and the H on the acryloyl double bond , n=3 can be calculated.

[0037]

[0038] Wherein, R...

Embodiment 3

[0040] Mix 100 parts by mass of gallic acid, 1000 parts by mass of dioxane, 270 parts by mass of allyl chloride and 60 parts by mass of sodium hydroxide, react at 60°C for 24 hours, and then add 500 parts by mass of dimethyl sulfoxide, 100 parts by mass of acryloyl chloride and 40 parts by mass of sodium hydroxide were mixed, reacted at 50°C for 12 hours, filtered, washed with water, and evaporated under reduced pressure to remove solvent and water to obtain the final product. 1The appearance of 5.21-5.49ppm and 5.84-6.13ppm in the HNMR spectrum represents the H on the allyl double bond, and the peak at 6.11-6.65ppm represents the H on the acryloyl double bond, plus other peaks and gallic acid group light The H proton displacement of the curing active monomer is consistent, proving that the obtained product is a gallic acid-based photocuring active monomer of the formula I structure; the peak area corresponding to the H on the allyl double bond and the H on the acryloyl double ...

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Abstract

The present invention discloses a gallic acid base light curing active monomer, which has a structure represented by a formula I, wherein R is H or CH3, n is more than 0 and is less than or equal to 3, the structure has four carbon-carbon double bond functional groups, and the monomer can be adopted as a multi-functional group cross-linking agent of an unsaturated polyester to carry out ultraviolet light curing so as to improve inherent defects of the free radical photo polymerization technology and the cation photo polymerization technology, and broaden the application field of gallic acid. The invention further discloses a gallic acid base light curing active monomer preparation method, wherein preparation is simple and easy to perform and control, and reproduceable gallic acid is adopted as a starting material so as to reduce or avoid use of petrochemical products from synthetic sources, and provide double effects of resource saving and environment protection.

Description

technical field [0001] The invention relates to the field of bio-based polymer materials, in particular to a gallic acid-based photocurable active monomer, a preparation method thereof and an application in preparing photocurable coatings. Background technique [0002] With the increasing depletion of petroleum resources and the seriousness of environmental pollution, using renewable plant resources as raw materials, research and development of environmentally friendly bio-based polymer materials to replace existing petrochemical raw materials, reduce the consumption of petrochemical products in the plastics industry At the same time, it also reduces the pollution to the environment in the production process of petroleum-based raw materials. It is an important development direction of current polymer materials, with important practical value and broad development space. [0003] Coatings are one of the most widely used polymer materials. In 2012, the total sales of global co...

Claims

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Application Information

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IPC IPC(8): C07C69/86C07C69/92C07C67/10C09D163/10C09D7/12
Inventor 江艳华刘小青朱锦马松琪樊利波
Owner NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI
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