Method for preparing nitrogen0gradient hard reaction membrane of titanium aluminum niobium nitride (TiAlNbN)

A titanium aluminum nitride, nitrogen gradient technology, applied in ion implantation plating, metal material coating process, coating and other directions, can solve the problems of large internal stress, high cost and long cycle of the film layer, and achieve good stability and repeatability, improve wear life, reduce the effect of coating cost

Inactive Publication Date: 2014-02-12
贵州中德西格姆精密制造有限公司
View PDF9 Cites 18 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] For the single-layer titanium-based multi-component hard reaction film, there are mainly the following disadvantages: 1. Generally, the film hardness and the film layer are easy to appear. The contradiction between adhesion, that is, hardness and adhesion are difficult to meet at the same time; 2. Multi-element

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0015] Preparation of TiAlNbN nitrogen gradient hard reaction film on commercial high-speed steel (W18Cr4V), the method is:

[0016] 1. Deposition technology and determination of target material composition: determine multi-arc ion plating as the preparation technology of TiAlNbN nitrogen gradient hard reaction film, select two arc sources with different orientations and arranged at 90 degrees to start arc deposition at the same time, one of the arc sources It is a commercial titanium-niobium alloy target with a purity of 99.9%, and the atomic ratio of the titanium-niobium alloy target is Ti:Nb=75:25; the other arc source is a commercial titanium-aluminum alloy target with a purity of 99.9%, and the atomic ratio of the titanium-aluminum alloy target is Ti:Al=50:50.

[0017] 2. Selection and pre-treatment of workpieces: commercial high-speed steel (W18Cr4V) is selected as the workpiece material, and before being put into the coating chamber for coating, the workpiece is routine...

Embodiment 2

[0024] Preparation of TiAlNbN nitrogen gradient hard reaction film on commercial high-speed steel (W6Mo5Cr4V2), the method is:

[0025] 1. Deposition technology and determination of target material composition: determine multi-arc ion plating as the preparation technology of TiAlNbN nitrogen gradient hard reaction film, select two arc sources with different orientations and arranged at 90 degrees to start arc deposition at the same time, one of the arc sources It is a commercial titanium-niobium alloy target with a purity of 99.9%, and the atomic ratio of the titanium-niobium alloy target is Ti:Nb=75:25; the other arc source is a commercial titanium-aluminum alloy target with a purity of 99.9%, and the atomic ratio of the titanium-aluminum alloy target is Ti:Al=50:50.

[0026] 2. Selection and pre-treatment of workpieces: commercial high-speed steel (W6Mo5Cr4V2) is selected as the workpiece material, and before being put into the coating chamber for coating, the workpiece is r...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
Adhesionaaaaaaaaaa
Hardnessaaaaaaaaaa
Hardnessaaaaaaaaaa
Login to view more

Abstract

The invention relates to a method for preparing a nitrogen-gradient hard reaction membrane of titanium aluminum niobium nitride (TiAlNbN). The method sequentially comprises steps of 1. confirmation of a deposition technique and ingredients of target materials; 2. selection and pretreatment of workpieces; 3. confirmation of a preliminary bombardment process; 4. confirmation of a deposition process; 5. vacuum heating treatment; 6. workpiece revolution. According to the method, the cost for coating is lowered, high adhesive force, high hardness and high thermal shock property of the membrane are guaranteed, furthermore, the inner stress of the membrane is reduced, and the reaction membrane has good stability and repeatability.

Description

technical field [0001] The invention relates to a method for preparing a nitrogen gradient hard reaction film, in particular to a method for preparing a multi-arc ion nitrogen-plated gradient hard reaction film by using a combined target, such as a titanium nitride aluminum niobium nitrogen gradient hard reaction film (hereinafter referred to as " TiAlNbN" instead of "titanium aluminum niobium nitride") preparation method. Background technique [0002] Multi-arc ion plating is a vacuum physical deposition technology with multiple cathode arc evaporation sources that can be evaporated simultaneously. It has the remarkable characteristics of fast deposition speed, dense film structure, strong adhesion, and good uniformity. This technology is suitable for the preparation of hard films and hard reactive gradient films, and has been successfully applied in the preparation of titanium nitride, titanium aluminum nitride and more hard reactive films. Titanium aluminum nitride, tita...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C23C14/32C23C14/06
Inventor 张钧尹利燕丰宇张健赵时璐李朝阳丁龙先
Owner 贵州中德西格姆精密制造有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap