Cotton endophytic fungi CEF-714 and application of cotton endophytic fungi CEF-714 to preventing and treating cotton verticillium wilt

A technology of CEF-714 and cotton verticillium wilt is applied to the endophytic fungus CEF-714 and its application field in the prevention and treatment of cotton verticillium wilt, which can solve the problems of poor cotton verticillium wilt effect and the like, and is conducive to mass reproduction. And popularization and application, the use method is simple, the growth effect is good

Active Publication Date: 2014-03-19
INST OF COTTON RES CHINESE ACAD OF AGRI SCI
View PDF2 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The inventors of the present invention propose and complete the present invention in order to solve the problem that the existing antagonistic microorganisms are less effective in preventing and controlling cotton Verticillium wilt

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Cotton endophytic fungi CEF-714 and application of cotton endophytic fungi CEF-714 to preventing and treating cotton verticillium wilt
  • Cotton endophytic fungi CEF-714 and application of cotton endophytic fungi CEF-714 to preventing and treating cotton verticillium wilt
  • Cotton endophytic fungi CEF-714 and application of cotton endophytic fungi CEF-714 to preventing and treating cotton verticillium wilt

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0020] The isolation of embodiment 1 bacterial strain

[0021] (1) Sample collection

[0022] From June to August, healthy cotton plants were selected, and the middle and upper parts of the main stem and fruiting branches were taken 15 cm.

[0023] (2) Isolation of strains

[0024] Firstly, the collected samples (cotton stalks) were washed with clean water, peeled, placed in a sterilized petri dish with a diameter of 9 cm, and sterilized with 75% alcohol for 1 min. Then disinfect with 5.0% sodium hypochlorite for 60 seconds, and wash with sterilized water for 3 times, each time not less than 3 minutes. Then use sterilized absorbent paper to dry the water on the surface, cut into 0.4cm long pieces with sterilized scissors, place them in a 9cm petri dish, and incubate at 25°C. Use the last cleaning solution as a control to check whether the disinfection is thorough. Check the growth of endophytic fungi every day, and find that there are colonies growing out, and transfer the...

Embodiment 2

[0033] The inhibitory effect of embodiment 2CEF-714 on Verticillium dahliae of cotton

[0034] 1. Test method

[0035] Buckle cultivation method. Pour a certain amount of PDA medium into the lid and bottom of the 90mm-diameter Petri dish respectively, and the culture medium in the lid is slightly less. After solidification, add 5 μl of Penicillium CEF-714 bacteria solution in the center of the dish cover (Chapic liquid culture for 7 days), and inoculate 5 μl of Verticillium wilt pathogen bacteria solution in the center of the dish bottom (Chapic liquid culture for 7 days). Put them into a constant temperature incubator at 25°C, and culture them upside down. Take the petri dish inoculated only with pathogenic bacteria as a control, and repeat each treatment 4 times. The growth of pathogenic bacteria and Penicillium hyphae were observed every day, and the colony diameter of pathogenic bacteria was measured by cross method 7 days after inoculation with Verticillium dahliae, and...

Embodiment 3

[0041] The control effect of embodiment 3CEF-714 to cotton verticillium wilt

[0042] 1. Test method

[0043] CEF-714 was cultured in Chapic liquid medium at 25°C and shaken in the dark for 7 days, filtered through filter paper, and the culture filtrate was obtained for seed soaking. The control strain Vd080 (strong pathogenic strain of Verticillium dahliae of cotton) was cultured in Chapic liquid medium at 25°C and shaken in the dark for 7 days, filtered through three layers of gauze, and the spore suspension was obtained for inoculation. Four treatments were set up in the experiment, namely 25%, 50% and 100% CEF-714 culture filtrate and water soaking.

[0044] Mix the sterilized vermiculite and sand at a ratio of 6:4 to make a bottomless paper pot with a diameter of 6 cm, and place it in a plastic tray of 45 cm × 35 cm. The susceptible variety Jimian 11 was used as the test variety, and the delinted cotton seeds were soaked in the culture filtrate of CEF-818 for 12 hours, ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
diameteraaaaaaaaaa
Login to view more

Abstract

The invention relates to phytopathology and particularly relates to cotton endophytic fungi CEF-714 and an application of cotton endophytic fungi CEF-714 to preventing and treating cotton verticillium wilt. The preservation number of the cotton endophytic fungi CEF-714 is CGMCC (China General Microbiological Culture Collection Center) No.8304. The CEF-714 can be cultured on an artificial culture medium and is easy to obtain and culture, so that the industrial production as well as the popularization and the application are facilitated. Indoor bacteriostatic tests show that the inhibition effect on the cotton verticillium wilt by metabolites of the CEF-714 is 100%; the inhibition effects on the cotton verticillium wilt by generated volatile metabolites is 77.5%. A room temperature test result shows that the prevention and treatment effect on the cotton verticillium wilt by using 25% CEF-714 culture filtering solution to immerse seeds is 60.6%; the control effect on the verticillium wilt is obvious; compared with that in bacillus subtilis which is mostly applied to the production, the prevention and treatment effect is improved by about 34.7%; the CEF-714 has no toxic side effects on the growth of crops, is safe to humans and livestock, insects and the crops and has the environment-friendly effect.

Description

technical field [0001] The invention relates to plant pathology, in particular to cotton endophytic fungus CEF-714 and its application in the control of cotton verticillium wilt. Background technique [0002] Verticillium dahliae caused by Verticillium dahliae is one of the important diseases of cotton worldwide. Since it was introduced into my country in the 1930s, the damage has become increasingly serious. Disasters, with an annual area of ​​about 3 million hectares and a loss of about 100 million kilograms of lint, have become one of the main limiting factors for the development of cotton production. The main reasons for the analysis of the hazards of the disease are the difficulty of crop rotation, lack of disease-resistant varieties, and the lack of pesticides with good control effects. [0003] The use of beneficial microorganisms to control the occurrence and harm of plant diseases is economical and environmentally friendly. At present, the use of antagonistic micro...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C12N1/14A01N63/04A01P3/00C12R1/645
Inventor 朱荷琴冯自力李志芳王玲飞赵丽红师勇强郑綋爽
Owner INST OF COTTON RES CHINESE ACAD OF AGRI SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap