Nanocomposite bipolar storage battery and preparation process of bipolar plate matrix of nanocomposite bipolar storage battery
A nano-composite material and preparation technology, which is applied in the field of nano-composite bipolar batteries, can solve the problems of plate damage, active substance PbO2, shortening the service life of lead-acid batteries, and large potential differences between lead-acid batteries Long life, high toughness and strength, and the effect of reducing internal resistance
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[0025] Example 1
[0026] Such as figure 1 Shown: The preparation method of nanocomposite bipolar battery matrix, its steps are:
[0027] Thermoplastic or thermosetting high molecular polymer, conductive material, placed in an oven, at a temperature of 80 or 100 or 110 or 120 or 130 or 140 or 150 ℃, drying for 0.5 or 1.0 or 1.5 or 2.0 or 2.5 or 3.0h , The thermosetting or thermoplastic polymer is one or more combinations of polyethylene, polypropylene, polybutadiene, polystyrene, polycarbonate, ABS powder and profiles, and the conductive material is metallic lead , Metal alloys, acetylene black, carbon black, graphite, carbon nanotubes, polyaniline, and titanium oxide. The particle size of the conductive material ranges from nanometers or nanometers to micrometers.
[0028] Use 30-100g of the above mixture, in which thermoplastic or thermosetting high molecular polymer accounts for 60% to 99.9%, conductive material accounts for 0.1% to 40%, preheated at 100 to 180°C, preloaded at 0....
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[0036] Example 2
[0037] Such as figure 2 , image 3 Shown: The preparation process of sputtering metallic lead on the surface of the nanocomposite bipolar battery substrate:
[0038] The hot-pressed substrate 1 is processed by vacuum magnetron sputtering technology, that is, a balance coil is set in the middle of the metal target, which is connected to the power supply, and the magnetic field generated by the coil and the external magnetic field together affect the vacuum magnetron sputtering system of the metal. The metallic lead sputtering of the base 1 is completed to obtain the pole plate base required for recombination.
[0039] The substrate 1 is as described in Example 1, and the details are as above.
[0040] Vacuum magnetron sputtering technology, working pressure 10-6Pa, sputtering chamber temperature 50℃, argon flow 50, working voltage 100V, working current 1.8A, magnetic field 350Gs, working frequency 30KHz, precipitation rate 0.3um / min, circulating cooling The water ...
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