High temperature and salt spray resistance solar energy selective absorbing coating in atmosphere and preparation method of coating
An absorption coating, high temperature resistant technology, applied in solar thermal power generation, coatings, solar thermal devices, etc., can solve the problems of complex process, high cost, unstable microstructure and physical properties, etc.
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[0073] The invention provides a method for preparing a high temperature resistant, salt spray resistant solar selective absorption coating in the atmosphere, such as figure 2 As shown, including the following steps:
[0074] Step 1: Prepare the first diffusion barrier layer on the substrate;
[0075] Using pure metal target intermediate frequency magnetron sputtering method, pure metal target is Al target, Ti target, Si target or Cr target, prepared with Ar gas as the sputtering gas, the substrate is made of stainless steel, and the vacuum chamber is pre-exhausted before sputtering. Vacuum to 4×10 -3 ~5×10 -3 Pa, inert gas Ar and O 2 As a sputtering atmosphere, or Ar and N 2 As the sputtering atmosphere, the flow of Ar gas is 100-140sccm, the flow of oxygen is 20-45sccm, if nitrogen is used, the flow is 8-20sccm, adjust the sputtering distance to 130-150mm, and adjust the sputtering gas pressure to 3×10 -1 ~4×10 -1 Pa, turn on the sputtering target power supply of the pure metal ta...
Embodiment 1
[0109] This embodiment provides a 2 And TiO 2 The structure of the atmospheric high temperature resistant, salt spray resistant solar selective absorption coating, the coating includes six coatings, divided into the first diffusion barrier layer, the second infrared emission layer, the third diffusion barrier, the fourth Layer absorbing layer, fifth layer anti-reflection layer, sixth layer organic protective layer.
[0110] The first layer of TiO 2 The film thickness is 50nm, the total thickness of the second Cu film is 150nm, the third TiO 2 The film is 50nm, the fourth layer of SiO 2 +TiO 2 The film is 140nm, and the first sub-layer SiO 2 +TiO 2 The film thickness is 80nm, the second sub-layer SiO 2 +TiO 2 Film thickness is 60nm, SiO in the first sublayer 2 The volume percentage is 40%, the rest is TiO 2 ; The second sublayer SiO 2 The volume percentage is 60%, the rest is TiO 2 ; The fifth layer of SiO 2 The film thickness is 100 nm; the sixth layer thickness is 150 nm.
[0111] ...
Embodiment 2
[0129] This embodiment provides a 3 N 4 And Ni 3 N 2 The structure of the atmospheric high temperature resistant and salt spray resistant solar selective absorption coating is divided into the first diffusion barrier layer, the second infrared emission layer, the third diffusion barrier, the fourth absorption layer, and the fifth anti-reflection layer Layer, sixth organic protective layer.
[0130] The first layer is Si 3 N 4 Film, thickness is 60nm, second layer is Cu film, thickness is 180nm, third layer is Si 3 N 4 The thickness of the film is 60nm, the total thickness of the fourth layer is 160nm, the thickness of the first sublayer is 100nm, the thickness of the second sublayer is 60nm, and the Si in the first sublayer 3 N 4 The volume percentage is 40%, the rest is Ni 3 N 2 ; The second sublayer Si 3 N 4 The volume percentage is 60%, the rest is Ni 3 N 2 ; The fifth layer is SiO 2 The film has a thickness of 120nm; the sixth layer is an organic protective layer with a thickne...
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