Preparation method of sapphire micro-capillary and die used in preparation method

A microcapillary and sapphire technology, applied in the field of sapphire microcapillary preparation, can solve the problems of poor concentricity between the inner hole and the sapphire tube, unsuitable sapphire tube, etc., and achieve good transparency, high product yield, and good crystal integrity Effect

Inactive Publication Date: 2014-10-08
牛玥
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Single crystal sapphire tube is a single crystal grown slowly from the melt, not polycrystalline, not machined, nor sintered with high-temperature alumina powder. Single crystal sapphire tube has very high transparency and has a regular appearance. , smooth surface, good crystal integrity, etc., and due to a series of excellent properties such as high melting point, high hardness, corrosion resistance, and good infrared transmittance of sapphire crystal itself, such products can be used in semiconductors, chemicals, In the high-tech fields of aviation, aerospace, national defense and other industries, most of the existing sapphire tube processing methods are as follows

Method used

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  • Preparation method of sapphire micro-capillary and die used in preparation method

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Embodiment 1

[0023] A method for preparing a sapphire microcapillary, using the edge-limited film feeding and pulling growth technology, comprising the following preparation method:

[0024] 1), the selection of raw materials, select high-purity aluminum oxide as raw materials;

[0025] 2) The processing of the mold, the mold is divided into two parts, the inner mold and the outer mold. Both the inner mold and the outer mold are processed to a mirror level, and then a small hole is ground in the middle of the top of the inner mold, and then the small hole Process the top of the inner mold into a tapered shape as a benchmark, and then chamfer the outer mold. The concentricity between the small hole on the top of the inner mold and the edge of the inner mold is less than 0.01mm, and the clamping surface between the slope of the outer mold and the outer wall of the inner mold The angle is 100°; the diameter of the small hole of the inner mold is 0.1mm, and the depth is 2mm; the distance betwe...

Embodiment 2

[0029] A method for preparing a sapphire microcapillary, using the edge-limited film feeding and pulling growth technology, comprising the following preparation method:

[0030] 1), the selection of raw materials, select high-purity aluminum oxide as raw materials;

[0031] 2) The processing of the mold, the mold is divided into two parts, the inner mold and the outer mold. Both the inner mold and the outer mold are processed to a mirror level, and then a small hole is ground in the middle of the top of the inner mold, and then the small hole Process the top of the inner mold into a tapered shape as a benchmark, and then chamfer the outer mold. The concentricity between the small hole on the top of the inner mold and the edge of the inner mold is less than 0.01mm, and the clamping surface between the slope of the outer mold and the outer wall of the inner mold The angle is 120°; the diameter of the small hole of the inner mold is 0.2mm, and the depth is 3mm; the distance betwe...

Embodiment 3

[0035] A method for preparing a sapphire microcapillary, using the edge-limited film feeding and pulling growth technology, comprising the following preparation method:

[0036] 1), the selection of raw materials, select high-purity aluminum oxide as raw materials;

[0037] 2) The processing of the mold, the mold is divided into two parts, the inner mold and the outer mold. Both the inner mold and the outer mold are processed to a mirror level, and then a small hole is ground in the middle of the top of the inner mold, and then the small hole Process the top of the inner mold into a tapered shape as a benchmark, and then chamfer the outer mold. The concentricity between the small hole on the top of the inner mold and the edge of the inner mold is less than 0.01mm, and the clamping surface between the slope of the outer mold and the outer wall of the inner mold The angle is 110°; the diameter of the small hole of the inner mold is 0.4mm, and the depth is 2mm; the distance betwe...

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Abstract

The invention provides a preparation method of a sapphire micro-capillary. An edge-defined film fed lifting growth technology is utilized. The preparation method comprises the following steps of (1) selecting a raw material, i.e., selecting high-purity aluminum oxide as the raw material; (2) machining a die; (3) placing the raw material in a crack between an outer die and an inner die, then, placing the die into a crucible, and next, placing the crucible in a crystal growing furnace; and (4) vacuumizing the crystal growing furnace, heating to melt aluminum oxide to form a melt, then, lifting the melt to the top of the inner die, starting to drop seed crystals, seeding and lifting. By using the method provided by the invention, defects that bubbles are generated on inner and outer walls of a machined sapphire pipe, and the parts containing the bubbles on the inner and outer walls need to be polished are avoided, and the one-step formation of the sapphire micro-capillary with a small internal diameter is realized; and in addition, the preparation method has the advantages of simple process, convenience in machining, high rate of finished products and the like.

Description

technical field [0001] The invention belongs to the technical field of crystal growth, and in particular relates to a method for preparing a sapphire microcapillary and a mold used therefor. Background technique [0002] Single crystal sapphire tube is a single crystal grown slowly from the melt, not polycrystalline, not machined, nor sintered with high-temperature alumina powder. Single crystal sapphire tube has very high transparency and has a regular appearance. , smooth surface, good crystal integrity, etc., and due to a series of excellent properties such as high melting point, high hardness, corrosion resistance, and good infrared transmittance of sapphire crystal itself, such products can be used in semiconductors, chemicals, In the high-tech fields of aviation, aerospace, national defense and other industries, most of the existing sapphire tube processing methods are as follows. Holes are drilled on solid rods. The disadvantage of this processing method is that the ...

Claims

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Application Information

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IPC IPC(8): C30B15/34C30B29/20
Inventor 薛鹏
Owner 牛玥
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