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Double-layer photothermal conversion composite material and preparation method thereof

A composite material, photothermal conversion technology, applied in the field of solar energy utilization, can solve the problems of poor thermal matching performance, pitting, cracking or peeling, etc., and achieve the effect of high working temperature, high thermal radiation rate and stable performance

Inactive Publication Date: 2014-11-19
赵骁
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] There are two main reasons why the working temperature of current photothermal conversion materials cannot be increased: first, most photothermal conversion materials contain components with poor temperature resistance besides oxides, nitrides, carbides and other materials (such as Nitrogen oxides, low-temperature metals), pitting corrosion is prone to occur when working above 673K; second, the thermal matching performance is poor, especially for materials with more than three layers, it is difficult to overcome the thermal stress change caused by severe thermal shock under high temperature conditions, directly causing cracking or peeling

Method used

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  • Double-layer photothermal conversion composite material and preparation method thereof

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Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] Preparation of ZrO on Ni-based Materials by Physical Vapor Deposition 2 -Y 2 o 3 / SiC double-layer light-to-heat conversion composite material:

[0027] A Ni alloy substrate with a size of 300×300 is used as the base material;

[0028] Polish the Ni alloy substrate sequentially with 400 mesh, 800 mesh and 1200 mesh sandpaper to remove scale and ensure the surface roughness is above 10nm;

[0029] The polished Ni alloy substrate was ultrasonically treated in water for 10 minutes;

[0030] Use 40% ethanol solution and acetone solution to clean the Ni alloy substrate surface after ultrasonic treatment in sequence;

[0031] Place the surface-treated Ni alloy substrate in the physical vapor deposition equipment, and select the target material ZrO 2 and Y 2 o 3 Simultaneous deposition, vacuum degree 7×10 -3 Pa, target distance 500mm, electron beam intensity 60mA, substrate deposition temperature 523K. After repeated deposition, ZrO with a thickness of 3mm was obtaine...

Embodiment 2

[0039] Preparation of TiO on Fe-based Materials by Magnetron Sputtering and Chemical Vapor Deposition 2 / TiC double-layer light-to-heat conversion composite material:

[0040] A hemispherical Fe alloy substrate with a diameter of 50mm is used as the base material;

[0041] Use 400-mesh, 800-mesh and 1200-mesh sandpaper to polish the Fe alloy substrate in sequence to remove scale and ensure that the surface roughness is above 5nm;

[0042] Ultrasonic treatment of the polished Fe alloy substrate in water for 10 min;

[0043] Using 40% ethanol solution and acetone solution to clean the surface of the Fe alloy substrate after ultrasonic treatment in sequence;

[0044] Place the surface-treated Fe alloy substrate in the magnetron sputtering equipment, using a metal Ti target, the reaction gas O 2 , sputtering gas Ar, reaction pressure 2Pa, substrate temperature 573K, pre-sputtering with Ar for 1min, TiO with a thickness of 50nm was obtained on the Fe alloy substrate 2 bottom tr...

Embodiment 3

[0052] Preparation of SiO on Co-based Materials by Physical Vapor Deposition and Chemical Vapor Deposition 2 / C double-layer light-to-heat conversion composite material:

[0053] A Ni alloy substrate with a size of 20×50 is used as the base material;

[0054] Polish the Co alloy substrate sequentially with 400-mesh, 800-mesh and 1200-mesh sandpaper to remove scale and ensure that the surface roughness is above 10nm;

[0055] The polished Co alloy substrate was ultrasonically treated in water for 10 minutes;

[0056] Use 40% ethanol solution and acetone solution to clean the surface of the Co alloy substrate after ultrasonic treatment in sequence;

[0057] Place the surface-treated Co alloy substrate in the physical vapor deposition equipment, and select the target material SiO 2 , vacuum degree 7×10 -3 Pa, target distance 500mm, electron beam intensity 60mA, substrate deposition temperature 473K. After repeated deposition, SiO with a thickness of 2 μm was obtained on the ...

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Abstract

The invention relates to a double-layer photothermal conversion composite material and a preparation method thereof, and belongs to the technical field of solar energy utilization. The composite material comprises a bottom transition layer and a top high-heat radiation rate layer, wherein the bottom transition layer and the top high-heat radiation rate layer of the composite material are prepared on a substrate material in sequence through a preparation method of vapor deposition or magnetron sputtering; the bottom transition layer and the substrate material are directly connected; and the top high-heat radiation rate layer and the bottom transition layer are also directly connected. The composite material has the characteristics of high working temperature, high heat radiation rate, strong heat shock resistance and long service life, and is a new high-performance photothermal conversion material.

Description

technical field [0001] The invention belongs to the technical field of solar energy utilization, in particular to a double-layer photothermal conversion composite material. technical background [0002] The photothermal conversion material is the core material in the field of solar thermal power generation. It converts light energy into thermal energy, and then heats the working medium through the conduction of the base material. The higher the thermal radiation rate and operating temperature of the photothermal conversion material, the higher the conversion efficiency of solar energy. high. [0003] With the continuous development of solar thermal power generation in the direction of high temperature and high efficiency, the working temperature of dish Stirling solar thermal power generation technology and the design working temperature of high temperature tower solar thermal power generation have exceeded 873K, and can work for a long time above this temperature my country...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/06C23C14/08C23C16/30C23C16/22F24J2/48
CPCY02E10/40
Inventor 赵骁
Owner 赵骁
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