Method for preparing novel GaN-based laser and GaN-based laser
A laser, a new type of technology, applied in lasers, laser parts, semiconductor lasers, etc., can solve epitaxial wafers that cannot be purchased from abroad for GaN-based lasers, GaN laser chips are difficult to prepare, development constraints, etc. problem, to achieve the effect of improving the light confinement effect, increasing the recombination efficiency, and increasing the confinement factor
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[0032] Use Aixtron company, tightly coupled vertical reaction chamber MOCVD growth system. During the growth process, at least one of trimethylgallium (TMGa), trimethylindium (TMIn), trimethylaluminum (TMAl) was used as a group III source, ammonia gas (NH 3 ) as the Group V source, silane (SiH 4 ) as an n-type dopant source, magnesiumocene (Cp 2 Mg) as a p-type dopant source, firstly heat the GaN substrate 101 to 1050 degrees Celsius in the MOCVD reaction chamber, hydrogen (H 2 ) atmosphere, using TMGa as the III source, NH 3 As a Group V source, SiH 4 4 micron thick n-GaN 102 grown as an n-type dopant source with an electron concentration of 5×10 18 cm -3 ; in hydrogen (H 2 ) atmosphere, at 850 ° C ~ 1050 ° C, using TMGa, TMAl and TMIn as the group III source, NH 3 As a group V source, SiH4 is used as an n-type dopant source to grow 150 cycles of modulation-doped Al composition and n-Al with In composition and asymmetric structure 0.15 Ga 0.85 N / GaN / Al 0.15 In 0....
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