Chromium-aluminum-silicon alloy target material and preparation method thereof
A silicon alloy and alloy target technology, which is applied in metal material coating process, ion implantation plating, coating and other directions, can solve the problems of difficult production technology of chromium-aluminum-silicon ternary alloy target materials, and improve high temperature oxidation resistance. The effect of performance, uniform organization and high density
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Embodiment 1
[0031] The chromium-aluminum-silicon alloy target provided in this example is composed of the following atomic percentages: 30% chromium, 60% aluminum, and 10% silicon, and the corresponding mass percentages are 45.1% chromium, 46.8% aluminum, and 8.1% silicon.
[0032] Its preparation method comprises the following steps:
[0033] Step 1, according to the design requirements of the above target material components, weigh 45.1 parts of metal chromium with a purity of 99.5%, 46.8 parts of metal aluminum with a purity of 99.7%, and 8.1 parts of metal silicon with a purity of 99.9%, and use the atomization powder making process to prepare An alloy powder with an average particle size of 40 μm was obtained.
[0034] Among them, the atomization powder making process is to use the arc melting method to melt the metal, and use the inert gas-metal atomization powder making method to prepare the above alloy powder.
[0035] In step 2, the obtained alloy powder is put into a cold isost...
Embodiment 2
[0042] The chrome-aluminum-silicon alloy target provided in this embodiment is composed of the following atomic percentages: 9% chromium, 90% aluminum, and 1% silicon.
[0043] Its preparation method comprises the following steps:
[0044]Step 1, according to the design requirements of the above-mentioned target material components, weigh 16 parts of metal chromium with an average particle size of 80 μm and a purity of 99.5%, 83 parts of metal aluminum with a purity of 99.7%, and 1 part of metal silicon with a purity of 99.9%. Mix in a V-type mixer for 3 hours, and protect by vacuuming during the mixing process, and the vacuum degree is controlled at about 10-2Pa.
[0045] Step 2: Put the mixed alloy powder into a cold isostatic pressing mold, and perform cold isostatic pressing treatment under a pressure of 150 MPa, and the holding time is 10 minutes.
[0046] Step 3: Put the blank after cold isostatic pressing into a metal sheath of appropriate size, place the sheath in a d...
Embodiment 3
[0052] The chromium-aluminum-silicon alloy target provided in this embodiment is composed of the following atomic percentages: 5% chromium, 75% aluminum, and 20% silicon.
[0053] Its preparation method comprises the following steps:
[0054] Step 1, according to the design requirements of the above-mentioned target material components, weigh 9.1 parts of metallic chromium with an average particle size of 150 μm and a purity of 99.5%, 71.2 parts of metallic aluminum with a purity of 99.7%, and 19.7 parts of metallic silicon with a purity of 99.9%. It was mixed in a V-type mixer for 5 hours, and filled with high-purity argon for protection during the mixing process;
[0055] Step 2, put the mixed powder into a cold isostatic pressing mold for cold isostatic pressing, the cold isostatic pressing pressure is 200MPa, and the holding time is 20min;
[0056] Step 3, put the cold isostatic pressing billet into a metal sheath of appropriate size, place the sheath in a degassing devic...
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