Chromium-aluminum-silicon alloy target material and preparation method thereof

A silicon alloy and alloy target technology, which is applied in metal material coating process, ion implantation plating, coating and other directions, can solve the problems of difficult production technology of chromium-aluminum-silicon ternary alloy target materials, and improve high temperature oxidation resistance. The effect of performance, uniform organization and high density

Active Publication Date: 2015-03-18
北京安泰六九新材料科技有限公司 +1
View PDF4 Cites 15 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The production technology of chrome-aluminum-silicon ternary alloy target is ver

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Chromium-aluminum-silicon alloy target material and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] The chromium-aluminum-silicon alloy target provided in this example is composed of the following atomic percentages: 30% chromium, 60% aluminum, and 10% silicon, and the corresponding mass percentages are 45.1% chromium, 46.8% aluminum, and 8.1% silicon.

[0032] Its preparation method comprises the following steps:

[0033] Step 1, according to the design requirements of the above target material components, weigh 45.1 parts of metal chromium with a purity of 99.5%, 46.8 parts of metal aluminum with a purity of 99.7%, and 8.1 parts of metal silicon with a purity of 99.9%, and use the atomization powder making process to prepare An alloy powder with an average particle size of 40 μm was obtained.

[0034] Among them, the atomization powder making process is to use the arc melting method to melt the metal, and use the inert gas-metal atomization powder making method to prepare the above alloy powder.

[0035] In step 2, the obtained alloy powder is put into a cold isost...

Embodiment 2

[0042] The chrome-aluminum-silicon alloy target provided in this embodiment is composed of the following atomic percentages: 9% chromium, 90% aluminum, and 1% silicon.

[0043] Its preparation method comprises the following steps:

[0044]Step 1, according to the design requirements of the above-mentioned target material components, weigh 16 parts of metal chromium with an average particle size of 80 μm and a purity of 99.5%, 83 parts of metal aluminum with a purity of 99.7%, and 1 part of metal silicon with a purity of 99.9%. Mix in a V-type mixer for 3 hours, and protect by vacuuming during the mixing process, and the vacuum degree is controlled at about 10-2Pa.

[0045] Step 2: Put the mixed alloy powder into a cold isostatic pressing mold, and perform cold isostatic pressing treatment under a pressure of 150 MPa, and the holding time is 10 minutes.

[0046] Step 3: Put the blank after cold isostatic pressing into a metal sheath of appropriate size, place the sheath in a d...

Embodiment 3

[0052] The chromium-aluminum-silicon alloy target provided in this embodiment is composed of the following atomic percentages: 5% chromium, 75% aluminum, and 20% silicon.

[0053] Its preparation method comprises the following steps:

[0054] Step 1, according to the design requirements of the above-mentioned target material components, weigh 9.1 parts of metallic chromium with an average particle size of 150 μm and a purity of 99.5%, 71.2 parts of metallic aluminum with a purity of 99.7%, and 19.7 parts of metallic silicon with a purity of 99.9%. It was mixed in a V-type mixer for 5 hours, and filled with high-purity argon for protection during the mixing process;

[0055] Step 2, put the mixed powder into a cold isostatic pressing mold for cold isostatic pressing, the cold isostatic pressing pressure is 200MPa, and the holding time is 20min;

[0056] Step 3, put the cold isostatic pressing billet into a metal sheath of appropriate size, place the sheath in a degassing devic...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
The average particle sizeaaaaaaaaaa
Average grain sizeaaaaaaaaaa
Average grain sizeaaaaaaaaaa
Login to view more

Abstract

The invention provides a chromium-aluminum-silicon alloy target material and a preparation method thereof. The alloy target material is prepared from the following components in atom percentage: 5-75 percent of chromium, 10-90 percent of aluminum and 1-20 percent of silicon. The preparation method comprises the steps of preparing alloy powder, carrying out cold isostatic pressing treatment, degassing, carrying out heat isostatic pressing treatment and mechanically processing. The chromium-aluminum-silicon alloy target material has the advantages of high compactness, no pores or segregation, uniform texture, fine crystalline grain and the like, and is suitable for sputtering coatings of multiple cutters and molds.

Description

technical field [0001] The invention belongs to the field of powder metallurgy preparation, in particular to a chrome-aluminum-silicon alloy target and a preparation method thereof. Background technique [0002] Since the 1960s, after nearly half a century of development, tool surface coating technology has become the main method to improve tool performance. Tool surface coating mainly increases cutting speed and feed rate by improving tool surface hardness, thermal stability, and reducing friction coefficient, thereby improving cutting efficiency and greatly increasing tool life. [0003] Coatings of cutting tools and tools and molds have gone through multiple stages such as TiN and TiAlN, and gradually transformed into CrN and CrAlN coatings to improve the wear resistance of tools and molds. At present, pure chromium or chromium aluminum alloy targets have been developed to prepare this film layer. The CrAlN film is plated on the surface of the material by vacuum sputter...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C22C27/06C22C21/00C22C21/02C22C30/00C22C1/05C23C14/34
Inventor 张凤戈唐培新姚伟张路长姜海赵雷高明
Owner 北京安泰六九新材料科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap