Method for preparing nano-porous silicon from Cu nano-particles by two-step auxiliary etching

A nanoporous, assisted etching technology, applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve problems such as nanoporous silicon that is not specified, and achieve the effects of easy industrial production, easy operation, and low production cost.
CN104576353AInactive Publication Date: 2015-04-29KUNMING UNIV OF SCI & TECH

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
KUNMING UNIV OF SCI & TECH
Publication Date
2015-04-29
Estimated Expiration
Not applicable · inactive patent

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Abstract

The invention relates to a method for preparing nano-porous silicon from Cu nano-particles by two-step auxiliary etching and belongs to the technical field of preparation of nano-materials. The method comprises the following steps: firstly, pre-treating a silicon chip; performing surface oxidation treatment on the pre-treated silicon chip by using a physical or chemical method to form an oxidation layer; preparing a deposition solution and an etching solution; placing the silicon chip with the oxidation layer in the deposition solution for chemical deposition, taking out the silicon chip, placing the silicon chip in the etching solution, completely etching the silicon chip, then soaking the silicon chip into nitric acid, washing the silicon chip by using a great amount of deionized water, and then blow-drying the silicon chip by nitrogen to obtain the nano-porous silicon. The method offers a great help to the improvement of the surface area and the reaction activity of the nano-porous silicon, the surface reflectivity of the nano-porous silicon is greatly reduced, and the method has broad application prospect in the fields of nano-sensors and nano-catalysis.
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Description

technical field

[0001] The invention relates to a method for preparing nanoporous silicon by two-step assisted etching of Cu nanoparticles, belonging to the technical field of nanomaterial preparation. Background technique

[0002] In recent decades, with the continuous development of society, the potential application prospects of nanomaterials in many fields have aroused widespread research interest due to their unique physical and chemical properties such as nanoeffects and huge specific surface areas. With the advancement of science and technology, silicon nanomaterials, as a new type of semiconductor material, exhibit novel physical properties such as quantum confinement effects and surface effects with the continuous reduction in diameter, which also makes them useful in light, electricity, Thermal, magnetic and catalytic reactions show significantly different physical properties from other materials, so they show very important application potential in the fields of p...

Claims

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