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Preparation method of boron carbide coating used for quartz substrate

A boron carbide and base material technology, which is applied in metal material coating process, coating, vacuum evaporation plating, etc., can solve the problem of low bonding strength between the corrosion-resistant ceramic coating and the quartz cover, and achieve increased roughness, The effect of increasing the bonding strength of the interface

Inactive Publication Date: 2015-06-17
INST OF MICROELECTRONICS CHINESE ACAD OF SCI +1
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  • Application Information

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Problems solved by technology

However, B produced by atmospheric plasma spraying 4 C The bonding strength between the corrosion-resistant ceramic coating and the quartz cover is not high, so it is necessary to find a way to improve its bonding strength with the quartz substrate

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  • Preparation method of boron carbide coating used for quartz substrate

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Embodiment Construction

[0022] The technical solution of the present invention will be described in detail below in conjunction with the accompanying drawings and embodiments.

[0023] Such as figure 1 As shown, the embodiment of the present invention provides a method for preparing a boron carbide coating applied to a quartz substrate, comprising the following steps:

[0024] (1) Select the boron carbide powder with a particle size range of 5-50 μm and good fluidity, and send the boron carbide powder into the plasma spraying equipment;

[0025] (2) Perform Ti ion implantation treatment on the surface of the quartz substrate to be sprayed, and the dose of Ti ion implantation is 1~9×10 16 ion / cm 2 , and then use acetone and absolute ethanol to clean the surface of the quartz substrate;

[0026] (3) Plasma spraying with Sluzer Metco UniCoat plasma spraying equipment, spray gun type F4MB; in Ar and H 2 The surface of the quartz substrate is plasma sprayed in a spraying gas environment, the flow rate...

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Abstract

The invention relates to the technical field of semiconductor etcher lining and quartz surface anticorrosive treatment, and particularly relates to a preparation method of a boron carbide coating used for a quartz substrate. The preparation method includes the steps of: (1) selecting boron carbide powder and sending the boron carbide powder into plasma spraying equipment; (2) conducting Ti ion implantation treatment on a to-be-sprayed quartz substrate surface, and then using acetone and anhydrous ethanol to clean the surface of the quartz substrate; and (3) carrying out plasma spraying on the quartz substrate surface by plasma spraying equipment to obtain the boron carbide coating. The method provided by the invention performs Ti ion implantation treatment on the quartz substrate surface, and increases the quartz substrate surface roughness, thus improving the interface bonding strength between the boron carbide coating and the quartz substrate.

Description

technical field [0001] The invention relates to the technical field of semiconductor etching machine inner lining and quartz surface anticorrosion treatment, in particular to a preparation method of a boron carbide coating applied to a quartz substrate. Background technique [0002] At present, the low-temperature plasma microfabrication method is the key technology for micro-nano processing of materials. It is the basis of preparation technologies such as microelectronics, optoelectronics, micromechanics, and micro-optics. One of the processes is completed by means of plasma processing, such as plasma film deposition, plasma etching, and plasma deglue. Among them, plasma etching is one of the most critical processes, and it is an irreplaceable process to realize the high-fidelity transfer of micro-patterns in VLSI production from photolithographic templates to silicon wafers. [0003] During the etching process, etching gas (mainly F-based and Cl-based gases) is introduced...

Claims

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Application Information

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IPC IPC(8): C23C4/10C23C14/48C23C14/18C23C4/134
Inventor 王文东夏洋李楠
Owner INST OF MICROELECTRONICS CHINESE ACAD OF SCI