Visible light responded load type Bi2WO6/Bi2O3 heterojunction photocatalyst and preparation method thereof

A photocatalyst and visible light technology, which is applied in the direction of light water/sewage treatment, etc., can solve the problems of reduced practical applicability of photocatalytic technology, reduced photocatalytic activity of photocatalytic materials, and easy agglomeration of particles, achieving high visible light absorption capacity and preparation The condition is non-toxic and has no secondary pollution effect

Inactive Publication Date: 2015-06-24
JILIN UNIV
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Problems solved by technology

Nanoparticle photocatalytic materials are directly applied to the liquid phase suspension system. The separation of small particles is a complex work, which consumes energy and time, and the particles are easy to agglomerate, thus reducing the photocatalytic activity of photocatalytic materials, so that photocatalytic technology can be used in environmental purification. Reduced practical applicability in the field

Method used

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  • Visible light responded load type Bi2WO6/Bi2O3 heterojunction photocatalyst and preparation method thereof
  • Visible light responded load type Bi2WO6/Bi2O3 heterojunction photocatalyst and preparation method thereof
  • Visible light responded load type Bi2WO6/Bi2O3 heterojunction photocatalyst and preparation method thereof

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preparation example Construction

[0040] A method for preparing a visible light-responsive loaded Bi2WO6 / Bi2O3 heterojunction photocatalyst, comprising the following steps:

[0041] A At room temperature, dissolve 1.0g-1.5g sodium oleate into 30ml-50ml ethylene glycol solution to make a mixed solution;

[0042] B Add 1.90g-2.1g bismuth nitrate to the mixed solution, stir the mixed solution until clear;

[0043] C Take 0.5g-0.8g sodium tungstate and dissolve it in 20ml-30ml ethylene glycol solution, then add it into the mixed solution in step B, and keep stirring until completely dissolved;

[0044] D Add 0.04g-0.06g graphene or 4.0g-6.0g volcanic slag, and continue to stir until evenly mixed;

[0045] E. Place the uniformly mixed solution in an autoclave, the filling amount is 80% of the autoclave capacity, and heat at 180°C for 20h;

[0046] F, after the autoclave is naturally cooled to room temperature, take out the mixture of solid and solvent, and wash off residual organic carbon with ethanol and distill...

Embodiment 1

[0050] Bi 2 WO 6 / Bi 2 o 3 Preparation method of heterojunction photocatalyst

[0051] A At room temperature, dissolve 1.22g sodium oleate into 40.00Ml ethylene glycol solution to make a mixed solution;

[0052] B adds 1.94g bismuth nitrate to the mixed solution, stirs the mixed solution until clear;

[0053] C Dissolve 0.66g of sodium tungstate in 30.00mL of ethylene glycol solution, then add it to the mixed solution in step B, and keep stirring until completely dissolved;

[0054] D adds 5g of volcanic slag, and continues to stir until it is evenly mixed;

[0055] E. Place the uniformly mixed solution in an autoclave, the filling amount is 80% of the autoclave capacity, and heat at 180°C for 20h;

[0056] F, after the autoclave is naturally cooled to room temperature, take out the mixture of solid and solvent, and wash off residual organic carbon with ethanol and distilled water;

[0057] G. After drying at 60°C for 12 hours, a supported Bi2WO6 / Bi2O3 heterojunction ph...

Embodiment 2

[0062] Bi 2 WO 6 / Bi 2 o 3 Preparation method of heterojunction photocatalyst

[0063] A At room temperature, dissolve 1.0g sodium oleate into 40.00Ml ethylene glycol solution to make a mixed solution;

[0064] B adds 1.90g bismuth nitrate to the mixed solution, stirs the mixed solution until clear;

[0065] C Dissolve 0.60g of sodium tungstate in 20.00mL of ethylene glycol solution, then add it to the mixed solution in step B, and keep stirring until completely dissolved;

[0066] D adds 5.5g of volcanic slag, and continues to stir until it is evenly mixed;

[0067] E. Place the uniformly mixed solution in an autoclave, the filling amount is 80% of the autoclave capacity, and heat at 180°C for 20h;

[0068] F, after the autoclave is naturally cooled to room temperature, take out the mixture of solid and solvent, and wash off residual organic carbon with ethanol and distilled water;

[0069] G. After drying at 60°C for 12 hours, a supported Bi2WO6 / Bi2O3 heterojunction p...

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Abstract

The invention relates to a visible light responded load type Bi2WO6 / Bi2O3 heterojunction photocatalyst and a preparation method thereof. The visible light responded load type Bi2WO6 / Bi2O3 heterojunction photocatalyst is prepared from the following components in parts by weight: sodium oleate, an ethanediol solution, bismuth nitrate, sodium tungstate and a carrier. The preparation method is simple and the operation is simple and convenient; preparation conditions are moderate and are free from toxin and secondary pollution is not caused in a preparation process; the batch production can be realized; the prepared visible light responded load type Bi2WO6 / Bi2O3 heterojunction photocatalyst has a high visible light absorption capability, has strong light absorption property and strong organic matter light degradation capability in a visible light region, and has a good application prospect of degrading RhB under the visible light; and particularly, the degradation rate of rhodamine B can be up to 99.5% under the condition of illuminating for 90 minutes under visible light with the wavelength more than nm. The prepared composite photocatalyst is convenient to recycle and reuse, and the difficulty that the recycling is difficult when a photocatalysis technology is actually applied in environment purification can be solved.

Description

technical field [0001] The present invention relates to a kind of photocatalyst and preparation method, especially the loading type Bi of visible light response 2 WO 6 / Bi 2 o 3 Heterojunction photocatalysts, especially Bi 2 WO 6 / Bi 2 o 3 / graphene composite photocatalyst and Bi 2 WO 6 / Bi 2 o 3 / volcanic slag composite photocatalyst and preparation method, and their application in degrading rhodamine B under visible light irradiation. Background technique [0002] Bismuth tungstate is considered to be one of the semiconductor catalysts with the best visible light catalytic activity among bismuth-based oxides, and has attracted extensive attention from scholars in recent years. However, due to the limitations of the rapid recombination of photogenerated electron-hole pairs and the narrow visible light response range, the visible light catalytic activity of a single bismuth tungstate catalyst is inhibited. Therefore, for a single Bi 2 WO 6 Modification and mod...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J23/31C02F1/30
Inventor 张凤君王天野钟爽肖国生
Owner JILIN UNIV
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