Point-array surface enhanced raman substrate and preparation method

Abstract

The invention relates to the technology of the surface enhanced raman substrate, and particularly relates to a point-array surface enhanced raman substrate and a preparation method. The preparation method comprises the following steps: a. preparing iron oxide particles with uniform particle size; b. covering each iron oxide particle with a gold layer to obtain a gold-cladding magnetic nano particle; c. preparing a silicon chip substrate with point-array micro pits; d. washing the silicon chip substrate, and drying the silicon chip substrate; e. carrying out hydrophilic treatment on the silicon chip substrate; f. gathering the gold-cladding magnetic nano particles in the micro pits; and g. cleaning the gold-cladding magnetic nano particles overflowing from the micro pits on the silicon chip substrate to obtain the hard surface enhanced raman substrate. The point-array surface enhanced raman substrate is prepared in the method. By adopting the preparation method, the active substrate with high sensitivity, good repetition and high uniformity and stability can be prepared.

Description

technical field [0001] The invention relates to a surface-enhanced Raman substrate technology, in particular to a dot-array surface-enhanced Raman substrate and a preparation method. Background technique [0002] Surface-enhanced Raman Scattering (SERS) has attracted widespread attention since it was discovered in 1974, because of its high sensitivity, it can detect monomolecular layers and sublayers adsorbed on metal surfaces. Molecules in the monolayer, which can give the structural information of surface molecules, are considered to be a very effective tool for probing interface properties and intermolecular interactions, and characterizing surface molecular adsorption behavior and molecular structure. SERS technology has gradually become a powerful research method in the field of surface science and electrochemistry, and has been widely used in trace analysis and even single molecule detection, chemistry and industry, environmental science, biomedical systems, nanomateri...

AI Technical Summary

Problems solved by technology

There are many traditional SERS active substrates commonly used at present, such as: electrochemically roughened noble metal active electrode substrates, noble metal sol active substrates, vacuum-evaporated noble metal island film active substrates, and chemically etched and chemically deposited noble metal active substrates. However, these self-assembled Reactive substrates provide difficult-to-control surface roughness, which affects the stability, uniformity, and reproducibility of spectra of adsorbed molecules

In recent years, the methods for preparing ordered surface nanostructures that have been studied more have some disadvantages and limitations in preparation and application. For example, the surface nanostructures prepared by electron beam lithography and scanning probe method have a small area, Low yield and expensive equipment; for self-organized growth methods and nanoimprint methods, it is often difficult to adjust the structural parameters of surface nanostructures

Moreover, its development is limited due to its cumbersome preparation procedures, high preparation costs and low preparation efficiency.

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