Intermediate band solar cell structure based on rare bismuth phosphide
A solar cell and phosphide technology, applied in circuits, photovoltaic power generation, electrical components, etc., can solve the problems of deterioration of material properties, inability to achieve interlayer electron tunneling, and failure of solar cell conversion efficiency to achieve easy compensation or regulation. , the strain is small, the effect of improving the conversion efficiency
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0039] Example 1: InP-based lattice-matched mid-band high-efficiency solar cell
[0040] InP doped with 1.0 atomic percent bismuth in InP 0.99 Bi 0.01 Single crystal thin films have a strong photoluminescence peak at 0.65eV at room temperature (see image 3 ). According to theoretical predictions (A.Luque&A.Marti, Phys.Rev.Lett.78,5014(1997)), the energy corresponding to the required high-level transition is 1.19eV, and the total transition energy is 1.84eV. Using the InP-based lattice Matched Al x Ga 1-x AsSb, adjusting the composition of Al and Ga and Al x Ga 1-x The band offset of AsSb / InP, in Al x Ga 1-x Insertion of InP in AsSb 0.99 Bi 0.01 form Al x Ga 1-x AsSb / InP 0.99 Bi 0.01 The multi-quantum well structure acts as an absorption region, which can achieve a photoelectric conversion efficiency of 62%, and the strain introduced by 1% bismuth atoms is negligible. See the specific structure Figure 5 , elaborated as follows:
[0041] (1) A 100nm silicon-do...
Embodiment 2
[0046] Example 2: GaAs-based strain-compensated mid-band high-efficiency solar cells
[0047] InP doped with 1.1 atomic percent bismuth in InP 0.989 Bi 0.011 Single crystal thin films have a strong photoluminescence peak at 0.7eV at room temperature, see image 3 . According to theoretical predictions, the energy corresponding to the required high-level transition is 1.23eV, and the total transition energy is 1.93eV. Using GaAs-based tensile strained In x (AlGa) 1-x P(x0.989 Bi 0.011 The resulting compressive strain, while obtaining the total transition energy required, using In x (AlGa) 1-x P / InP 0.989 Bi 0.011 The multi-quantum well structure acts as an absorption region, which can achieve a photoelectric conversion efficiency of 63%. See the specific structure Image 6 , elaborated as follows:
[0048] (1) Grow a 100nm silicon-doped GaAs buffer layer on an n-type GaAs substrate with a doping concentration of 10 18 cm -3 above;
[0049] (2) Grow n-type In that ...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 