Sulfide target cosputtering preparation method of CZTSSe film and product thereof
A technology of co-sputtering and sulfide, which is applied in the direction of sputtering coating, final product manufacturing, metal material coating process, etc., can solve the problems of low repeatability of film preparation process and uneven distribution of various elements of film, and achieve film Thickness is easy to control, solving the effect of poor sample quality and few pinholes
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[0059] (1) On the soda-lime glass substrate, Cu-Zn-Sn-S precursor prefabricated film was prepared by co-sputtering:
[0060] Ⅰ. Clean the glass substrate with ionized water;
[0061] Ⅱ. Wash the glass substrate with dilute hydrochloric acid, then shake it with deionized water for 5 minutes;
[0062] Ⅲ. After cleaning the glass substrate with carbon tetrachloride, then ultrasonically oscillate with carbon tetrachloride for 10 minutes;
[0063] Ⅳ. After cleaning the glass substrate with acetone, then ultrasonically oscillate with acetone for 10 minutes;
[0064] Ⅴ. After cleaning the glass substrate with absolute ethanol, then ultrasonically oscillate with absolute ethanol for 10 minutes;
[0065] Ⅵ. Store the glass substrate in absolute ethanol for later use;
[0066] VII. Take out the glass substrate from absolute ethanol, put it into the sputtering chamber of the magnetron co-sputtering instrument after drying.
[0067] Ⅷ. Co-sputtering to prepare Cu-Zn-Sn-S precursor pre...
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