Treatment method for multi-crystalline silicon texturization etching waste liquid
A technology for etching waste liquid and treatment method, which is applied in the preparation of fluoride, halogenated silicon compounds, magnesium nitrate, etc., can solve the problems of inability to discharge directly, high pollution from photovoltaics, harmful gases, liquid and solid emissions, etc., to achieve protection effects of the environment
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0018] The present embodiment provides a kind of processing method of polysilicon texturing waste etching liquid, and it comprises the following steps:
[0019] (a) Add sodium chloride to the etching waste liquid under stirring conditions at 0°C, so that the molar ratio of fluorosilicate ion to sodium element in sodium chloride is 1:1, react until no precipitation occurs, and filter Obtain the first precipitate and the first filtrate;
[0020] (b) Add calcium hydroxide to the first filtrate under stirring conditions at 0°C, so that the molar ratio of the sum of fluoride ions and nitrate ions in the first filtrate to the calcium element in the added calcium hydroxide is 1.5:1, React to produce precipitation no longer, filter to obtain the second precipitation and the second filtrate;
[0021] (c) Concentrating and crystallizing the second filtrate to obtain solid calcium nitrate.
Embodiment 2
[0023] The present embodiment provides a kind of treatment method of polysilicon texture etching waste liquid, and it comprises the following steps:
[0024] (a) Add a mixture of sodium chloride and sodium hydroxide to the etching waste liquid under stirring conditions at 40°C, so that the molar ratio of fluorosilicate ion to sodium element in the added sodium compound is 1:4, React until no precipitation occurs, and filter to obtain the first precipitation and the first filtrate;
[0025] (b) Add magnesium chloride to the first filtrate under stirring conditions at 40°C, so that the molar ratio of the sum of fluoride ions and nitrate ions in the first filtrate to the magnesium element in the added magnesium chloride is 4:1, and the reaction will stop Produce precipitation, filter to obtain the second precipitation and the second filtrate;
[0026] (c) Concentrating and crystallizing the second filtrate to obtain solid magnesium nitrate.
Embodiment 3
[0028] The present embodiment provides a kind of treatment method of polysilicon texture etching waste liquid, and it comprises the following steps:
[0029] (a) Add potassium hydroxide to the etching waste liquid under stirring conditions at 20°C, so that the molar ratio of fluorosilicate ion to potassium element in the added potassium hydroxide is 1:2, and react until no precipitation occurs , filtered to obtain the first precipitate and the first filtrate;
[0030] (b) Add calcium hydroxide to the first filtrate under stirring conditions at 20°C, so that the molar ratio of the sum of fluoride ions and nitrate ions in the first filtrate to the calcium element in the added calcium hydroxide is 3:1, React to produce precipitation no longer, filter to obtain the second precipitation and the second filtrate;
[0031] (c) Concentrating and crystallizing the second filtrate to obtain solid calcium nitrate.
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com