Macromolecule-based resistance type humidity sensing element and preparation method thereof
A moisture-sensitive component and polymer-based technology, applied in the direction of material resistance, can solve the problems of resistance-type polymer humidity sensors with unsatisfactory water resistance and loss of sensitive substances, and achieve high sensitivity, good stability, and mild conditions.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Publication Date
- 2015-11-11
- Estimated Expiration
- Not applicable · inactive patent
Smart Images
Figure 1 Figure 2 Figure 3
Abstract
Description
technical field
[0001] The invention belongs to the technical field of humidity sensitive elements and preparation thereof, and in particular relates to a polymer-based resistance type humidity sensitive element and a preparation method thereof. Background technique
[0002] In the earth's atmosphere, gaseous water molecules are a very important component. The precise measurement and control of humidity is crucial in many fields such as aerospace, warehousing, environmental monitoring, medical care, structural health monitoring, industrial and agricultural production, and precision instrument protection. important.
[0003] Humidity sensors can convert ambient humidity into corresponding measurable electrical signals, including resistance, capacitance, and complex impedance. Among a wide variety of humidity sensors, resistive humidity sensors are widely used due to their simple structure and convenient signal processing. The humidity-sensitive materials are mainly organic p...
Examples
Embodiment 1
[0025] Preparation of P1 polymer elements
[0026] Octapropylmercaptooctasilsesquioxane (300.0mg, 294.7μmol), divinylbenzene (115.1mg, 884.2μmol), methacryloxyethyltrimethylammonium chloride (80wt% aqueous solution, 153.0mg, 589.4 μmol), benzoin dimethyl ether (6.0 mg, 23.6 μmol) were added into the reaction flask, and tetrahydrofuran (1 mL) was added to dissolve the reactant. After the reactants are evenly mixed, the carbon interdigitated electrodes (substrate area 5mm×8mm, four pairs of electrodes, electrode width 300μm, inter-finger spacing 350μm) are immersed in the solution for about 10 seconds, then taken out, and dried in the air for two minutes With ultraviolet light (120mJ / cm 2 ) was irradiated for 30 minutes to carry out polymerization, and the thickness of the obtained cross-linked humidity sensitive film was 28 μm, thereby preparing a polymer-based resistance type humidity sensitive element.
Embodiment 2
[0028] Preparation of P2 polymer elements
[0029] Octapropylmercaptooctasilsesquioxane (300.0 mg, 294.7 μmol), divinylbenzene (105.5 mg, 810.5 μmol), methacryloxyethyltrimethylammonium chloride (80 wt % aqueous solution, 191.3 mg, 736.8 μmol), benzoin dimethyl ether (6.0 mg, 23.6 μmol) were added into the reaction flask, and tetrahydrofuran (1 mL) was added to dissolve the reactant. After the reactants are evenly mixed, the carbon interdigitated electrodes (substrate area 5mm×8mm, four pairs of electrodes, electrode width 300μm, inter-finger spacing 350μm) are immersed in the solution for about 10 seconds, then taken out, and dried in the air for two minutes With ultraviolet light (120mJ / cm 2 ) was irradiated for 30 minutes to carry out polymerization, and the thickness of the obtained cross-linked humidity sensitive film was 25 μm, thereby preparing a polymer-based resistance type humidity sensitive element.
Embodiment 3
[0031] Preparation of P3 polymer elements
[0032] Octapropylmercaptooctasilsesquioxane (300.0 mg, 294.7 μmol), divinylbenzene (124.7 mg, 957.9 μmol), methacryloyloxyethyltrimethylammonium chloride (80 wt % aqueous solution, 114.8 mg, 442.1 μmol), benzoin dimethyl ether (6.0 mg, 23.6 μmol) were added into the reaction flask, and tetrahydrofuran (1 mL) was added to dissolve the reactant. After the reactants are evenly mixed, the carbon interdigitated electrodes (substrate area 5mm×8mm, four pairs of electrodes, electrode width 300μm, inter-finger spacing 350μm) are immersed in the solution for about 10 seconds, and then put out after drying in the air for two minutes. With ultraviolet light (120mJ / cm 2 ) was irradiated for 30 minutes to carry out polymerization, and the thickness of the obtained cross-linked humidity sensitive film was 25 μm, thereby preparing a polymer-based resistance type humidity sensitive element.