Method for improving the performance of gallium nitride laser

A GaN-based, laser technology, used in lasers, laser components, semiconductor lasers, etc., can solve problems such as aggravating negative effects, hindering hole injection, and reducing effective electron barrier.

Active Publication Date: 2015-11-11
INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
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Problems solved by technology

[0004] Although the introduction of the electron blocking layer AlGaN can reduce electron leakage, there are also two negative effects
First, due to the strong polarization of the electron blocking layer AlGaN, the conduction band of the last quantum barrier is bent downward, which makes it easy for the quasi-Fermi level of electrons to enter the conduction band, r...

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  • Method for improving the performance of gallium nitride laser
  • Method for improving the performance of gallium nitride laser
  • Method for improving the performance of gallium nitride laser

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Embodiment Construction

[0020] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with specific embodiments and with reference to the accompanying drawings.

[0021] The present invention proposes a GaN-based laser, which includes:

[0022] There is an insertion layer between the electron blocking layer and the P-type waveguide layer of the GaN-based laser;

[0023] The material of the insertion layer is doped indium gallium nitrogen, its thickness is 2-15 nm, and the indium composition is 0.005-0.05.

[0024] Due to the introduction of the insertion layer, the above-mentioned laser proposed by the present invention brings two benefits in terms of energy band structure: first, holes are easily injected. The polarization direction of the InGaN insertion layer is from the p region to the n region, causing the valence band of the insertion layer to bend upwards, and the quasi-Fer...

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Abstract

The invention discloses a gallium nitride laser and a fabrication method thereof. The method comprises the following steps of: 1, sequentially fabricating a n-type limitation layer, a n-type waveguide layer, a quantum well active region, an electron barrier layer, an insertion layer, a p-type waveguide layer, a p-type limitation layer and a p-type contact layer on a gallium nitride substrate; 2, leading the P-type contact layer and the P-type limitation layer to form ridge shapes by wet etching or dry etching; 3, growing a layer of oxidation film on the fabricated ridge shapes, and fabricating a p-type ohmic electrode by using a photoetching method; 4, fabricating the gallium nitride substrate thinner and washing, and fabricating an n-type ohmic electrode on the gallium nitride substrate; and 5, carrying out cleavage and film coating, and finally packaging the gallium nitride substrate on a tube shell to make the gallium nitride laser. In the laser proposed by the invention, with the introduction of the insertion layer, two advantages can be brought to the structure: 1, hole injection is facilitated; and 2, effective potential barrier of an electron is increased.

Description

technical field [0001] The invention relates to the technical field of semiconductor optoelectronic devices, in particular to a design and manufacturing method of a gallium nitride-based laser with improved performance. Background technique [0002] With the rapid development of semiconductor optoelectronic devices, gallium nitride semiconductor lasers came into being. Gallium nitride lasers, especially in the blue-violet light band, can provide smaller spot size and greater depth of focus than red and infrared lasers, so that higher resolution, faster laser printing and high density There are a wide range of applications in storage systems. In addition, the combination of blue lasers with existing red and green lasers has broad prospects in the fields of projection display and full-color printing. Therefore, people have higher requirements on the performance of gallium nitride lasers. [0003] The gallium nitride-based laser material layer is mainly divided into three pa...

Claims

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Application Information

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IPC IPC(8): H01S5/343H01S5/22H01S5/323
Inventor 李翔赵德刚江德生刘宗顺陈平朱建军
Owner INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
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