Method for preparing Na-doped molybdenum planar targets

Abstract

The invention discloses a method for preparing Na-doped molybdenum planar targets. The method comprises the steps of firstly, stirring mixed powder of molybdenum powder and sodium molybdate dehydrate with deionized water uniformly, and performing spray drying to obtain Na-doped molybdenum particles; secondly, loading the Na-doped molybdenum particles into an isostatic cool pressing mold and sealing the mold, then performing isostatic cool pressing, and removing the isostatic cool pressing mold after pressing to obtain plate blank; thirdly, jacketing the plate blank and performing vacuumizing and sealing; and fourthly, performing hot-pressed sintering on the plate blank and then performing jacket removal treatment to obtain the Na-doped molybdenum planar targets. According to the method, the preparation cost is low, the material use rate is high, the content of Na in the targets and the structure are controllable, the product consistency is good, and the requirement for the Na-doped molybdenum planar targets for industrial production can be well met.

Description

technical field [0001] The invention belongs to the technical field of molybdenum material processing and molding, and in particular relates to a preparation method of a sodium-doped molybdenum planar target. Background technique [0002] Cu(In,Ga)Se 2 (CIGS) is a multi-component semiconductor material with excellent performance and high photoelectric conversion efficiency. Thin-film solar cells are designed based on it, and its photoelectric conversion efficiency has reached 20.4%, which is the highest level in the world. It is found that doping a small amount of alkali metal Na (about 5 at%) in CIGS can significantly improve its photoelectric conversion efficiency. For industrially produced CIGS solar panels, it is necessary to dope Na into the large-area CIGS absorber layer to improve its photoelectric conversion efficiency. Generally, lime sodium carbonate glass (SLG) is directly used as the substrate to produce CIGS solar panels, and SLG is used as the Na source mater...

AI Technical Summary

Problems solved by technology

[0004] At present, there are many methods for preparing Mo-Na sputtering targets that have been reported. From the perspective of patented technologies, there are mainly hot isostatic pressing methods, conventional sintering methods, and vacuum hot pressing methods. From the analysis of these patents, The hot isostatic pressing method is a method commonly used at home and abroad. This method can prepare qualified Mo-Na sputtering targets, but its material utilization rate is low and the manufacturing cost is high; the conventional sintering method is proposed in Chinese patent 201310033234.1. This patent does not take into account the volatility of Na and has no practical industrial application value; the hot pressing method is proposed in Chinese patent 201410308148.1, which is relatively low in cost, but does not propose control of the target structure, and in this method The hot pressing temperature is low, the density of Mo-Na billet is relatively poor, and due to the volatile pollution of a large amount of sodium molybdate dihydrate (the melting point of sodium molybdate dihydrate is 687°C), a large amount of white dihydrate molybdate will adhere to the surface of the furnace cavity. Sodium molybdate, Na content is not easy to control and other disadvantages

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