Nitride phosphor powder for liquid crystal backlight and preparation method thereof
A nitrogen oxide and phosphor technology, applied in the field of phosphors, can solve the problems that the activator cannot fully enter the crystal lattice, affect the luminous intensity of the phosphors, and the luminous performance of the phosphors is low, and achieves good reduction effect, low cost, and improved performance. The effect of fluorescent properties
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Embodiment 1
[0047] Weigh Si 3 N 4 19.136g, AlN0.247g, Al 2 o 3 0.307g, EuCl 3 0.311g, then add 0.1% NH 4 Cl is the flux, and the above raw materials are fully mixed evenly, put into a boron nitride crucible, and then quickly moved into a tube furnace, and then gradually heated up to 800°C in a vacuum state, with a heating rate of 15°C / min, and then Gradually introduce high-purity nitrogen gas to a pressure of 0.3MPa, raise the temperature to 1300°C, and the heating rate is 10°C / min, then gradually pressurize to a pressure of 0.8MPa, raise the temperature to 1980°C, the heating rate is 6°C / min, and keep warm for 7 hours , after cooling, grind and sieve, wash with 2% nitric acid, stir for 30min, and finally wash with deionized water until the conductivity is 4.2μs / cm, and dry to obtain Si 6.8 Al 0.2 o 0.2 N 9.13 :Eu 0.02 Nitride phosphors. The emission main peak and luminous intensity are shown in Table 1, both of which are higher than those of Comparative Example 1. Emission spe...
Embodiment 2
[0049] Weigh Si 3 N 4 19.034g, AlN0.385g, Al 2 o 3 0.319g, EuF 3 0.262g, then add 0.1% NH of the total mass of the above raw materials 4 Cl is the flux, and the above raw materials are fully mixed evenly, put into a boron nitride crucible, and then quickly moved into a tube furnace, and then gradually heated up to 800°C in a vacuum state, with a heating rate of 15°C / min, and then Gradually introduce high-purity nitrogen gas to a pressure of 0.3MPa, raise the temperature to 1300°C, and the heating rate is 10°C / min, then gradually pressurize to a pressure of 0.8MPa, raise the temperature to 1980°C, the heating rate is 6°C / min, and keep warm for 7 hours , after cooling, grind and sieve, wash with 2% nitric acid, stir for 30min, and finally wash with deionized water until the conductivity is 5.1μs / cm, and dry to prepare Si 6.5 Al 0.25 o 0.25 N 8.75 :Eu 0.02 Nitride phosphors. The emission main peak and luminous intensity are shown in Table 1, both of which are higher tha...
Embodiment 3
[0051] Weigh Si3N419.327g, AlN0.339g, Al2O30.14g, Eu2O30.194g, then add 0.1% NH4Cl of the total mass of the above raw materials as a flux, mix the above raw materials uniformly, put them into a boron nitride crucible, and then It quickly moved into the tube furnace, and then gradually heated up to 800°C in a vacuum state with a heating rate of 15°C / min, then gradually introduced high-purity nitrogen to a pressure of 0.3MPa, and raised the temperature to 1300°C with a heating rate of 10°C / min. min, then gradually increase the pressure to 0.8MPa, raise the temperature to 1980°C, the heating rate is 6°C / min, keep the heat for 7 hours, grind and sieve after cooling, wash with 2% nitric acid, stir for 30min, and finally use Wash with deionized water until the conductivity is 4.7 μs / cm, and dry to prepare Si7.5Al0.2O0.2N10.07:Eu0.02 nitrogen oxide phosphor. The emission main peak and luminous intensity are shown in Table 1, and the luminous intensity is higher than that of Comparati...
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