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Preparation method for solar battery emitting electrode

A technology of solar cells and emitters, applied in the field of solar cells, can solve the problems of increasing production costs, not being suitable for mass production, and reducing battery efficiency, so as to achieve the effects of increasing production costs, improving short-wave spectral response, and improving battery efficiency

Inactive Publication Date: 2016-01-06
ZHEJIANG JINKO SOLAR CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This oxidation method is difficult to achieve oxidation only on the surface of the emitter. Such high temperature and long-term heat treatment will cause the doping curve of the emitter to change, which may lead to a decrease in cell efficiency; significantly increase production costs, and are not suitable for mass production.

Method used

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Examples

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preparation example Construction

[0018] The invention provides a method for preparing a solar cell emitter, comprising: A) subjecting a silicon wafer to texturing, diffusion and etching treatments to obtain a pretreated silicon wafer; B) oxidizing the pretreated silicon wafer with ozone, An oxide layer is formed on the surface, and then the oxide layer is removed by a hydrofluoric acid solution to obtain a solar cell emitter.

[0019] Among them, the present invention has no special limitation on the sources of all raw materials, which can be commercially available.

[0020] The silicon wafer is subjected to texturing, diffusion and etching treatment to obtain a pretreated silicon wafer. The methods of texturing, diffusion and etching are all methods well known in the art, and there is no special limitation.

[0021] The said texturing is the acid texturing familiarized by those skilled in the art. In the present invention, a mixed acid solution of nitric acid, hydrofluoric acid and water is preferably used...

Embodiment 1

[0030] 1.1 A 156mm×156mm P-type polysilicon wafer is used for pre-texturing, diffusion, and etching processes to obtain pretreated silicon wafers.

[0031] 1.2 Form an oxide layer on the surface of the pretreated silicon wafer by direct oxidation with ozone at room temperature, and the thickness of the formed oxide layer is 1nm.

[0032] 1.3 Use hydrofluoric acid solution to remove the oxide layer, the mass concentration of the hydrofluoric acid solution is 5%, and the time is 3 minutes.

[0033] 1.4 Perform processes such as anti-reflection coating on the front, screen printing, sintering and other processes to complete the production of solar cells.

[0034] The conversion efficiency of the solar cell prepared in Example 1 is increased by 0.02% compared with the conventional process solar cell (no ozone oxidation removal process).

Embodiment 2

[0036] 2.1 A P-type polysilicon wafer of 156mm×156mm is used, and the pre-texturing, diffusion, and etching processes are carried out to obtain a pretreated silicon wafer.

[0037] 2.2 At room temperature, an oxide layer is formed on the surface of the pretreated silicon wafer by high-voltage ionization of ozone, and the thickness of the formed oxide layer is 1.5 nm.

[0038] 2.3 Use hydrofluoric acid solution to remove the oxide layer, the mass concentration of the hydrofluoric acid solution is 5%, and the time is 3 minutes.

[0039] 2.4 Carry out processes such as anti-reflection coating on the front, screen printing, sintering, etc., to complete the production of solar cells.

[0040] The conversion efficiency of the solar cell prepared in Example 2 is increased by 0.02-0.03% compared with the conventional process solar cell (no ozone oxidation removal process).

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Abstract

The invention provides a preparation method for a solar battery emitting electrode, comprising the steps of (A), texturing, diffusing and etching a silicon wafer to obtain a pretreated silicon wafer; and B) oxidizing the pretreated silicon wafer by ozone to form an oxide layer on the surface, and then removing the oxide layer by a hydrofluoric acid solution to obtain the solar battery emitting electrode. Compared with the prior art, the preparation method uses ozone to oxidize the pretreated silicon wafer to form the oxide layer on the surface at the normal temperature, and then the hydrofluoric acid solution is used to remove the oxide layer, so that the dead layer of the emitting electrode can be effectively removed, the short-wave spectral response of the solar battery is accelerated, and the battery efficiency is improved; and in addition, the preparation method is simple and controllable without dramatically increasing the production cost, so that the preparation method is suitable for large-scale production.

Description

technical field [0001] The invention belongs to the technical field of solar cells, in particular to a method for preparing a solar cell emitter. Background technique [0002] The N-type emitter of a P-type silicon solar cell is generally formed by thermal diffusion of phosphorus. Phosphorus thermal diffusion will form electroactive phosphorus and non-electroactive phosphorus in the silicon wafer. Since the non-electrically active phosphorus atoms are in the interstitial positions of the crystal lattice, it will cause lattice defects, and because the radii of phosphorus atoms and silicon atoms do not match, high Concentrations of phosphorus can also cause lattice mismatch. Therefore, in the surface layer of the solar cell, the lifetime of the minority carriers is extremely low, and the photogenerated carriers generated by the short-wavelength photons absorbed by the surface layer have almost zero contribution to the power output of the cell, and the surface layer becomes a ...

Claims

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Application Information

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IPC IPC(8): H01L31/0224
CPCH01L31/022425Y02E10/50
Inventor 金井升蒋方丹金浩
Owner ZHEJIANG JINKO SOLAR CO LTD
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