High-temperature antioxidation glaze layer material with infrared radiation heat-radiation effect and application thereof
A technology of heat dissipation and infrared radiation, applied in the field of high-temperature anti-oxidation glaze layer materials, can solve the problem of high cost, and achieve the effects of prolonging service life, uniform heating and preventing oxidation.
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Embodiment 1
[0024] A method for preparing a high-temperature anti-oxidation glaze layer with infrared radiation and heat dissipation, comprising the following steps:
[0025] a. The composition and mass percentage of the high-temperature anti-oxidation glaze layer with infrared radiation and heat dissipation are:
[0026] Zirconium silicate powder 80%
[0027] Glass glaze powder 20%
[0028] Add absolute ethanol, powder: absolute ethanol = 1:8, and make a slurry.
[0029] Add dispersant to the total amount of slurry, 1%.
[0030] Wherein, dispersing agent is Polyethylene Glycol, and the chemical composition of glass glaze powder and mass percent are:
[0031] SiO 2 71.57%
[0032] Al 2 o 3 14.20%
[0033] Na 2 O4.90%
[0034] BaO3.65%
[0035] CaO3.06%
[0036] K 2 O1.34%
[0037] B 2 o 3 1.28%
[0038] b. According to the formula in step a, the mixture is ball milled for 12 hours, the particle size of the slurry is about 1 micron, and the slurry is evenly coated on the s...
Embodiment 2
[0042] This example is basically the same as Example 1, except that the mass percentages of zirconium silicate powder and glass glaze powder are 70% and 30%, and the prepared samples are heat-treated at a high temperature of 1500°C. The high-temperature anti-oxidation glaze layer with infrared radiation heat dissipation effect prepared in this example is tested and analyzed. The glaze layer is composed of two phases of zirconium silicate and glass glaze, and the infrared radiation rate at room temperature is 0.931 in the whole band of 1~22μm. A dense glaze layer is formed on the surface of the silicon carbide sample. The results of the 1500°C oxidation test show that the material with the protective glaze layer does not appear to be oxidized, while the material without the protective glaze layer is obviously oxidized.
[0043] The silicon carbide sample coated with the glaze layer was quickly placed in a high-temperature furnace at 1500°C, taken out after 10 minutes, and cooled...
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