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Photosensitive resin composition

A technology of photosensitive resin and composition, applied in the field of photosensitive resin composition, can solve the problems of undisclosed alternatives, inability to achieve color reproduction, decreased light efficiency, etc. The effect of light efficiency

Active Publication Date: 2020-04-21
DONGWOO FINE CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, although the color reproduction is realized by the light irradiated by the light source passing through the color filter, in this process, because part of the light is absorbed by the color filter, the light efficiency decreases. The fundamental limit of perfect color reproduction cannot be reached due to the pigment properties of the flakes
[0005] In Korean Laid-Open Patent No. 2012-112188, although a red coloring composition for color filters and a color filter are disclosed, there is no disclosure at all about alternatives to the above problems.

Method used

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  • Photosensitive resin composition
  • Photosensitive resin composition

Examples

Experimental program
Comparison scheme
Effect test

preparation example 1

[0152] Preparation example 1. Synthesis of photoluminescent green quantum dot particles A-1 of CdSe (core) / ZnS (shell) structure

[0153] 0.4mmol of CdO, 4mmol of zinc acetate (Zincacetate), 5.5mL of oleic acid (Oleicacid) and 20mL of 1-octadecene (1-Octadecene) were put into the reactor together, and heated to 150°C to make the reaction. Afterwards, in order to remove acetic acid generated by substituting oleic acid with zinc, the reactant was placed under a vacuum of 100 mTorr for 20 minutes. Then, after applying heat at 310° C. to obtain a transparent mixture, after keeping it at 310° C. for 20 minutes, 0.4 mmol of Se powder and 2.3 mmol of S powder were dissolved in 3 mL of trioctylphosphine The resulting Se and S solutions were quickly injected into the Cd(OA) 2 and Zn(OA) 2 solution in the reactor. After allowing the mixture thus obtained to grow at 310° C. for 5 minutes, the growth was interrupted using an ice bath. Then, precipitate with ethanol, and then use a cen...

preparation example 2

[0154] Preparation example 2. Synthesis of alkali-soluble resin

[0155] Prepare a flask equipped with a stirrer, a thermometer, a reflux condenser, a dropping funnel, and a nitrogen introduction tube. Cyclodecyl methacrylate, 4 parts by weight of tert-butyl peroxy-2-ethylhexanoate, 40 parts by weight of propylene glycol monomethyl ether acetate (hereinafter referred to as PGMEA), stirred and mixed, prepared a single Body dropping funnel, add 6 parts by weight of n-dodecyl mercaptan, 24 parts by weight of PGMEA for stirring and mixing, and prepare a chain transfer agent dropping funnel. After that, 395 parts by weight of PGMEA was introduced into the flask, and the atmosphere in the flask was changed from air to nitrogen, and then the temperature of the flask was raised to 90° C. while stirring. Next, the monomer and the chain transfer agent were added dropwise from the dropping funnel. Dropping was performed for 2 hours while maintaining the temperature at 90°C. After 1 hou...

experiment example

[0166] (1) Absorbance measurement of photopolymerization initiator

[0167] After diluting each of the photopolymerization initiators used in the above Examples and Comparative Examples with propylene glycol monomethyl ether acetate to a concentration of 0.01 mol / liter, an absorbance meter (UV-2550, Shimadzu Corporation) was used The absorbance at 365 nm was measured, and the results are shown in Table 2 below.

[0168] (2) Evaluation of whether a fine pattern can be formed

[0169] In the color filters manufactured from the compositions of the above Examples and Comparative Examples, the width of the pattern obtained by passing through a line / space pattern mask with an opening width of 100 μm was measured using OM equipment (ECLIPSELV100POL, Nikon Corporation) , The difference between the opening width of the pattern mask and the pattern width was obtained, as shown in Table 2 below.

[0170] The smaller the difference between the opening width and the pattern width of the ...

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Abstract

The invention relates to a photosensitive resin composition, and more detailedly relates to a following photosensitive resin composition. The composition comprises photoluminescence quantum dot particles, a photopolymerizable compound, a polymerization initiator of which UV absorbancy with 365 nm of wave length is under 0.1 under 0.001 of molality, a alkali soluble resin and a solvent. With the above parts, a color filter which has greatly improved brightness and color reproducibility can be produced.

Description

technical field [0001] The present invention relates to a photosensitive resin composition. Background technique [0002] A color filter is a thin-film optical component that can filter out three colors of red, green, and blue from white light as fine pixel units, and the size of one pixel is about tens to hundreds of microns. This kind of color filter adopts the following structure: a black matrix layer formed by a pattern fixed on a transparent substrate in order to hide the boundary between pixels, and a plurality of colors (usually red) The three primary colors (R), green (G), and blue (B)) are sequentially laminated in pixel portions arranged in a predetermined order. Color filters can generally be manufactured by coating three or more hues on a transparent substrate by dyeing, electrodeposition, printing, or pigment dispersion. Recently, the pigment dispersion method using pigment-dispersed photosensitive resin has become mainstream. Methods. [0003] The pigment di...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/004G03F7/027
CPCB82Y20/00G02B5/223G02F1/133514G03F7/0007G03F7/028G03F7/031
Inventor 金胄皓朴颂基郑柏榕
Owner DONGWOO FINE CHEM CO LTD
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