Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Saccharomyces cerevisiae and application thereof in preparation of externally-applied agent for skin

A technology of Saccharomyces cerevisiae and seeds, applied in the field of microorganisms, can solve the problem of lack of Saccharomyces cerevisiae, and achieve the effect of resisting UV radiation, strong anti-aging and anti-aging ability, and strong ability to resist ultraviolet rays

Active Publication Date: 2016-03-23
JALA GROUP CORPORATION
View PDF1 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] Although the anti-aging substances derived from microorganisms that have anti-oxidant scavenging free radicals and anti-aging activities are increasingly being valued by the skin care industry, there is still a lack of Saccharomyces cerevisiae with strong UV resistance and glycosidase activity.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Saccharomyces cerevisiae and application thereof in preparation of externally-applied agent for skin
  • Saccharomyces cerevisiae and application thereof in preparation of externally-applied agent for skin
  • Saccharomyces cerevisiae and application thereof in preparation of externally-applied agent for skin

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0029] The acquisition of embodiment 1 novel microorganism of the present invention

[0030]The yeast strain (strain collection number CICC1210) purchased from the China Center of Industrial Culture Collection (CICC) was divided into two equal parts, and one part was carried into space by the Shenzhou 10 manned spacecraft. After 15 days in space After loading, the yeast strains DZ-39 and DZ-49 for space mutagenesis were isolated, and the other one was the starting strain CK as a control for the following experiments.

[0031] 1) Survival rate test in ultraviolet radiation (UV) environment

[0032] The specific steps of the survival rate in the ultraviolet radiation (UV) environment were carried out according to the literature method (QadriI, FatimaK, AbdeL-HafizH. HepatitisBvirusXproteinimpedestheDNArepairviaitsassociationwithtranscriptionfactor, TFIIH.BMCMicrobiol.2011; 11:48.).

[0033] The experimental results are shown in Table 1. Among them, the meaning of survival rate ...

Embodiment 2

[0047] Morphological and culture characteristics of embodiment 2 bacterial strain DZ-49

[0048] Morphological and cultural characteristics: The strain DZ-49 was cultured at 28°C in PDA liquid medium. After 48 hours, the colonies were observed, and the colonies were soft and dry. The colonies were milky white, round, slightly convex, with smooth edges, and the cells were round to Oval in shape, the mode of reproduction is budding, and pseudohyphae are formed.

Embodiment 3

[0049] Physiological and biochemical characteristics of embodiment 3 bacterial strain DZ-49

[0050] Physiological and biochemical characteristics of bacterial strain DZ-49 were analyzed with reference to Zu Ruofu, Hu Baolong, and Zhou Deqing's Microbiology Experiment Course (Fudan University Press, 1993).

[0051] It was found that the strain DZ-49 can utilize carbon sources glucose, sucrose, maltose, galactose, raffinose; Maltose, galactose or raffinose, cannot utilize carbon source lactose or melezitose. Strain DZ-49 did not assimilate xylose, glycerol or ethanol.

[0052] The strain DZ-49 was preserved in the China Center for Type Culture Collection (CCTCC) on December 7, 2015, and the preservation number was: CCTCCNo: M2015725, and the culture name was JBA-DZ-49-Gly-3-05, classified The name is Saccharomycescerevisiae.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses saccharomyces cerevisiae and application thereof in the preparation of an externally-applied agent for skin. The saccharomyces cerevisiae is collected in CCTCC (China Center for Type Culture Collection) and has the collection number of CCTCC No: M 2015725. The saccharomyces cerevisiae CCTCC No: M 2015725 has the characteristics of high ultraviolet ray resisting capability and high beta-glycosidase activity and can be applied to the preparation of the externally-applied agent for the skin, so as to achieve the aims of resisting oxidation and anti-aging.

Description

technical field [0001] The invention relates to the field of microorganisms, in particular to a brewer's yeast and its application in the preparation of skin external preparations. Background technique [0002] The theory of free radical aging (Harman, D. Aging: Atheory based on free radical and radiation chemistry. J. Gerontol. 1956, 11: 289-300) believes that excessive free radicals are an important cause of biological aging. According to this theory, excessive active oxygen free radicals in the body interact with unsaturated fatty acids to produce malondialdehyde and other substances, and malondialdehyde interacts with proteins on the cell membrane to produce brown pigment, which precipitates on the skin and becomes various stains. Excessive free radicals can also cause crosslinking, denaturation, brittleness, and loss of elasticity in the collagen fibers and elastic fibers in the skin. When the skin is insufficiently hydrated, it is easy to break the elastic fibers, and ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C12N1/18A61K8/99A61K36/06A61Q17/04A61Q19/00A61Q19/08C12R1/865
CPCA61K8/99A61K36/06A61K2800/10A61K2800/782A61Q17/04A61Q19/00A61Q19/08C12N1/18C12N1/185C12R2001/865
Inventor 方兆华祝坤章漳张佳伟李慧陈明华席淑云
Owner JALA GROUP CORPORATION
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products