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A kind of thin film transistor preparation method based on aqueous ultrathin ZrO2 high-k dielectric layer

A thin-film transistor and dielectric thin-film technology, which is applied in the field of thin-film transistor preparation, can solve problems such as blank research on p-type semiconductor devices, and achieve the effects of good product performance, low cost, and reliable principles

Inactive Publication Date: 2018-08-10
QINGDAO UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Through the review of relevant patents and literature, there are few reports on the preparation of TFT channel layers by the "water sol" method. Based on water-based ZrO 2 The all-aqueous low-temperature TFT device with high-k dielectric layer is even more unexplored
In addition, most of the reports on the use of solution-based TFT in the prior art focus on n-type semiconductor devices, and the research on p-type semiconductor devices is almost blank.

Method used

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  • A kind of thin film transistor preparation method based on aqueous ultrathin ZrO2 high-k dielectric layer
  • A kind of thin film transistor preparation method based on aqueous ultrathin ZrO2 high-k dielectric layer
  • A kind of thin film transistor preparation method based on aqueous ultrathin ZrO2 high-k dielectric layer

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Embodiment

[0027] Zirconium nitrate in the present embodiment, nickel nitrate and indium nitrate powder are all purchased from Aldrich Company, and purity is greater than 98%; Its bottom gate structure is based on ultra-thin zirconia (ZrO 2 ) is a high-k dielectric layer and indium oxide (In 2 o 3 ) and nickel oxide (NiO) film as the preparation process of the thin film transistor channel layer is:

[0028] (1) Preparation of ultra-thin ZrO by spin-coating with "aqueous sol" method 2 High-k dielectric films:

[0029] Step 1: Select commercially available single-sided polished low-resistance silicon as the substrate (~0.0015Ω·cm) and the gate electrode, and clean the low-resistance silicon substrate with hydrofluoric acid, acetone and alcohol ultrasonically for 10 minutes each. After repeated washing with deionized water, blow dry with high-purity nitrogen;

[0030] Step 2: Weigh 10mL of deionized water, dissolve zirconium nitrate in the aqueous solution according to 0.1M, mix and sti...

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Abstract

The invention relates to a preparation method of a thin film transistor based on a water-based ultrathin ZrO2 high k dielectric layer, and belongs to the technical field of semiconductor thin film transistor preparation. N type indium oxide and p type nickel oxide semiconductor channel layers are combined, so as to prepare the full water-based thin film transistor, low-resistivity silicon is used as a substrate and a gate electrode, and a water-based sol-gel method, UV optical processing and thermal annealing are combined, so as to prepare the ultrathin ZrO2 gate dielectric layer and the In2O3 and NiO semiconductor channel layers with high transmittance and good chemical stability, so that a TFT device with high performance and low energy consumption is prepared. The preparation method has the advantages of simple preparation process, low cost, simplicity and convenience in operation, reliable principle, good product performance, preparation environmental friendliness and wide application prospect, and a feasible plan is provided for widely preparing the thin film transistor with high performance.

Description

Technical field: [0001] The invention belongs to the technical field of semiconductor thin film transistor preparation, and relates to a method for preparing a thin film transistor based on a green and environmentally friendly hydrosol, in particular to a water-based ultra-thin zirconia (ZrO 2 ) is a high-k dielectric layer, with n-type indium oxide (In 2 o 3 ) and p-type nickel oxide (NiO) as a method for preparing a thin film transistor with a semiconductor channel layer. Background technique: [0002] In recent years, thin film transistors (Thin Film Transistor, TFT) have played an important role in active matrix liquid crystal display devices (Active Matrix Liquid Crystal Display, AMLCD), from low-temperature amorphous silicon TFT to high-temperature polysilicon TFT, technology is becoming more and more Mature, the application object has also developed from only driving LCD (Liquid Crystal Display) to both driving LCD and OLED (Organic Light Emitting Display), and even...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/34H01L29/786H01L29/51
CPCH01L29/517H01L29/66969H01L29/7869
Inventor 单福凯刘国侠朱春丹刘奥孟优
Owner QINGDAO UNIV
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