Iridium complex phosphorescent material-based and doped organic ultraviolet detector
A technology of iridium complexes and phosphorescent materials, applied in the field of organic ultraviolet detection devices, can solve problems such as low photoresponsivity, and achieve the effects of high responsivity, improved production efficiency, and strong ultraviolet light absorption
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Embodiment 1
[0046] Embodiment one (control group)
[0047] Clean the substrate composed of the substrate and the transparent conductive anode ITO, and dry it with nitrogen after cleaning; spin-coat PEDOT:PSS (1500rpm, 15nm) on the surface of the transparent conductive anode ITO to prepare the anode buffer layer, and the formed The film is baked (150°C, 30min); the electron blocking layer TAPC5nm is evaporated on the anode buffer layer, and the electron blocking layer is prepared by spin coating PVK:ZnO (60%:40%) ultraviolet photoactive layer (1500rpm, 120nm ), and baked (100° C., 15 min); the hole blocking layer Bphen5nm was prepared by evaporation on the surface of the ultraviolet photoactive layer, and the metal anode Ag (100nm) was evaporated on the hole blocking layer. Under standard test conditions: 350nm, 0.6mW / cm 2 Under the condition of -2V for ultraviolet light, the measured responsivity of the device is 1.5A / W.
Embodiment 2
[0049] Clean the substrate composed of the substrate and the transparent conductive anode ITO, and dry it with nitrogen after cleaning; spin-coat PEDOT:PSS (1500rpm, 15nm) on the surface of the transparent conductive anode ITO to prepare the anode buffer layer, and the formed The film was baked (150°C, 30min); the electron blocking layer TAPC5nm was evaporated on the anode buffer layer, and PVK:FIrpic:ZnO (60%:1%:39%) was prepared by spin coating on the electron blocking layer for ultraviolet light activity layer (1500rpm, 120nm), and baked (100°C, 15min); the hole blocking layer Bphen5nm was prepared by evaporation on the surface of the ultraviolet photoactive layer, and the metal anode Ag (100nm) was evaporated on the hole blocking layer. Under standard test conditions: 350nm, 0.6mW / cm 2 Under the condition of -2V for ultraviolet light, the measured responsivity of the device is 3.2A / W.
Embodiment 3
[0051] Clean the substrate composed of the substrate and the transparent conductive anode ITO, and dry it with nitrogen after cleaning; spin-coat PEDOT:PSS (1500rpm, 15nm) on the surface of the transparent conductive anode ITO to prepare the anode buffer layer, and the formed The film is baked (150°C, 30min); the electron blocking layer TAPC5nm is evaporated on the anode buffer layer, and the electron blocking layer is prepared by spin coating PVK:FIrpic:ZnO (60%:5%:35%) UV photoactive layer (1500rpm, 120nm), and baked (100°C, 15min); the hole blocking layer Bphen5nm was prepared by evaporation on the surface of the ultraviolet photoactive layer, and the metal anode Ag (100nm) was evaporated on the hole blocking layer. Under standard test conditions: 350nm, 0.6mW / cm 2 Under the condition of -2V for ultraviolet light, the measured responsivity of the device is 4.5A / W.
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