A kind of anti-reflection self-cleaning film and preparation method thereof

A self-cleaning, anti-reflection technology, applied in the final product manufacturing, sustainable manufacturing/processing, photovoltaic power generation, etc., can solve the problems that are difficult to adapt to photovoltaic cells such as wind and sand, hail, solar panel surface dirty, and affect the efficiency of battery components , to achieve good self-cleaning ability, degrade surface organic contamination, and improve the effect of capturing ability

Active Publication Date: 2017-10-03
SHANGHAI ADVANCED RES INST CHINESE ACADEMY OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] It is worth noting that although the above-mentioned nanostructure anti-reflection coating has excellent optical properties, its submicron structure has poor mechanical properties, and it is difficult to adapt to the severe test of wind, sand and hail when photovoltaic cells are working outdoors.
In addition, dust and debris caused by wind, sand, rain, and birds can easily stain the surface of solar panels and affect the efficiency of battery components

Method used

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  • A kind of anti-reflection self-cleaning film and preparation method thereof
  • A kind of anti-reflection self-cleaning film and preparation method thereof
  • A kind of anti-reflection self-cleaning film and preparation method thereof

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Embodiment 1

[0057] This embodiment provides a method for preparing an anti-reflection self-cleaning film, including: using imprinting technology and surface modification technology to process a three-dimensional pattern structure with a micron size on the transparent flexible film, so that the transparent flexible film has anti-reflection self-cleaning properties. Clean performance.

[0058] As an example, the embossing technology includes one of UV embossing, thermal embossing, thermal curing embossing, and micro-contact embossing, wherein the thermal embossing includes flat-bed embossing, roll-to-plate embossing, and A type of roll-to-roll embossing.

[0059] As an example, the UV embossing includes: coating a UV-curable glue on a transparent flexible film, then embossing the cured glue with a mold with a micron structure pattern, and separating the template from the substrate after being irradiated and cured by a UV lamp, that is Obtain the anti-reflection self-cleaning film.

[0060...

Embodiment 2

[0097] This embodiment provides a method for preparing an anti-reflection self-cleaning film, wherein, in this embodiment, the preparation process of the anti-reflection self-cleaning film prepared by a two-step hot pressing method is as follows:

[0098] Step 1), the clean ETFE film is embossed by means of roll-to-roll or roll-to-plate hot pressing, the hot pressing temperature is 120°C, and the surface structure of the roller is jagged (sawtooth period is 50 μm, height is 30 μm), The pressure between the two rollers is 10MPa, and the temperature and pressure of the instrument reach the set value.

[0099] Step 2), preheat the clean ETFE film on a heating plate at 50°C for 15s, and roll it at a speed of 7m / min to obtain an anti-reflection self-cleaning film, such as Figure 5c shown.

[0100] Step 3), the anti-reflection self-cleaning film prepared in step 2) (specifically ETFE anti-reflection hydrophobic film), the fourth hot-melt adhesive, solar cell glass cover plate, the...

Embodiment 3

[0102] This embodiment provides a method for preparing an anti-reflection self-cleaning film, wherein, in this embodiment, the preparation process of the anti-reflection self-cleaning film prepared by a two-step hot pressing method is as follows:

[0103] Step 1), use roll-to-roll or roll-to-plate hot pressing to emboss the clean ETFE film, the hot pressing temperature is 120°C, and the structure of the roller surface is sawtooth (the sawtooth period is 50 μm, and the height is 25 μm), The pressure between the two rollers is 10MPa, and the temperature and pressure of the instrument reach the set value.

[0104] Step 2), preheat the clean ETFE on a heating plate at 50°C for 15s, and roll it at a speed of 7m / min to obtain an anti-reflection self-cleaning film, such as Figure 5c shown.

[0105] Step 3), the backboard material (polyester film with waterproof vapor performance, its structure is a three-layer film composite material, wherein, the lower film is a resin containing f...

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Abstract

The present invention provides a self-cleaning reflection reduction film and a method of preparing the same. The preparation method comprises: using an imprint technology and a surface modification technology to process the transparent flexible film and produce a micrometer-scale three-dimensional patterned structure, to provide the transparent flexible film with reflection reduction performance and self-cleaning performance, and integrating the self-cleaning reflection reduction film and a window layer of a solar cell component, so that reflection on the surface of the window layer can be effectively inhibited, and a quantity of photons that enter an absorption layer of a cell can be increased, thereby improving photoelectric conversion efficiency of the cell, where the improvement in cell efficiency is particularly notable when sunlight enters at a slanted angle. The antireflective and self-cleaning film of the present invention may be chosen to be an ultra-hydrophobic film or an ultra-hydrophilic film. The ultra-hydrophobic film has a relatively high water contact angle. When the ultra-hydrophobic film is slanted, water drops easily fall off and take away pollutants on the surface, thereby implementing a self-cleaning effect. The ultra-hydrophilic film is combined with a catalytic effect of light, so that organic contaminants on the surface may be degraded, thereby also achieving a self-cleaning effect.

Description

technical field [0001] The invention belongs to the field of functional films, in particular to an anti-reflection self-cleaning film and a preparation method thereof. Background technique [0002] With the continuous consumption of fossil energy and the aggravation of environmental pollution, solar energy, as a clean and renewable new energy, has been valued by countries all over the world. Solar photovoltaic power generation is a technology that uses the photoelectric effect of semiconductors to directly convert light energy into electrical energy, and is one of the main new energy technologies. [0003] The large-scale promotion of photovoltaic power generation mainly depends on the improvement of its own efficiency and cost reduction. On the one hand, the efficiency can be improved by researching and optimizing the material of the semiconductor absorbing layer, adjusting the interface and energy band of the material, thereby broadening the absorption spectrum, improving...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L31/0232H01L31/0236H01L31/18B82Y40/00
CPCB82Y40/00H01L31/02327H01L31/02366H01L31/1876H01L31/0232H01L31/0236H01L31/18Y02E10/50Y02P70/50
Inventor 李东栋王敏马朋莎陈小源鲁林峰殷敏程伟杰刘东方方小红
Owner SHANGHAI ADVANCED RES INST CHINESE ACADEMY OF SCI
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