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In-situ chemical oxidation repair system and method for underground water polluted by hydrochloric ether

An in-situ chemical oxidation and repair method technology, which is applied in the field of in-situ chemical oxidation repair system for chlorinated hydrocarbon pollution in groundwater, can solve problems such as no waste gas collection system and secondary pollution, and achieve improved repair efficiency and increased oxidation capacity , Increase the effect of hydroxyl radicals

Inactive Publication Date: 2016-07-06
CHINESE ACADEMY FOR ENVIRONMENTAL PLANNING
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In addition, the patent does not set up an exhaust gas collection system, which may have the risk of secondary pollution

Method used

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  • In-situ chemical oxidation repair system and method for underground water polluted by hydrochloric ether

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Embodiment approach

[0044] In a specific embodiment, the method includes the steps of:

[0045] (1) Ozone preparation step: prepare ozone gas;

[0046] (2) Micro-nano ozone bubble water forming step: the ozone gas prepared in step (1) is formed into micro-nano bubble water, and is circulated with step (1) until the ozone concentration in the micro-nano bubble water reaches a specified range, and it is used for Remediation of chlorinated hydrocarbons in groundwater;

[0047] (3) Strengthening agent injection step: when the micro-nano ozone bubble water prepared in step (2) is injected into the groundwater, the strengthening agent is injected into the groundwater at the same time; and

[0048] (4) Waste gas collection and treatment steps: when the organic pollutant gas in soil and groundwater exceeds 1000mg / m 3 , for waste gas collection and treatment.

[0049] In a preferred embodiment, the specified range of the ozone concentration in the micro-nano bubble water in the method step (2) is 1 mg / ...

Embodiment 1

[0074] The method of in-situ oxidation remediation of groundwater contaminated by chlorinated hydrocarbons was used to remediate the groundwater polluted by high concentration of chlorinated hydrocarbons in a pesticide factory in the south. The site can be divided into artificial filling layer and Quaternary sedimentary layer from top to bottom. The artificial fill layer includes miscellaneous fill and plain fill. The thickness of miscellaneous fill is 0.3-2m, with an average thickness of 1m. The thickness of plain fill is 0.5-3.6m, with an average thickness of 1.9m. There are two layers of silty clay and silt, the upper layer is uniform in soil quality, and the lower layer contains more gravel particles, formed by slope accumulation, the silty clay layer is 0.3-7.4m thick, and the silt layer is 0.5-1.8m thick; the bedrock of the site includes mudstone, There are three types of shale and conglomerate, and the bedrock exposure depth varies from 1.2 to 8.1m. The groundwater in ...

Embodiment 2

[0076] In the same site as in Example 1, in areas with similar groundwater hydrogeological conditions and pollution concentrations, micro-nano ozone bubble water was used to remediate groundwater pollution. at 50m 2One injection well, two monitoring wells and two extraction wells are arranged in the groundwater polluted area. The average depth of the injection wells and monitoring wells is 4.3 meters. The well depth of the gas extraction well is 1 meter, the depth of opening the screen is 0.3 meters underground, and the length is 0.5 meters.

[0077] Start the ozone generator and the micro-nano ozone bubble water generator. When the ozone concentration reaches 1.5mg / L and the micro-nano bubble size is 60nm to 50μm, inject micro-nano ozone bubble water into the injection well every day. Nano-ozone bubble water, when the dissolved oxygen in the monitoring well rises significantly, use the enhancer injection tank to configure 5% H 2 o 2 , injected into the injection well. Dur...

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Abstract

The invention provides an in-situ chemical oxidation repair method for underground water polluted by hydrochloric ether through micro-nano ozone bubbles, and an in-situ chemical oxidation repair system for underground water polluted by hydrochloric ether.The system comprises an ozone preparation system, a micro-nano ozone bubble water preparation system, an enhancer injection system, a waste gas collection processing system and underground injection, monitoring and air extracting systems.The ozone preparation system and the micro-nano ozone bubble water preparation system are connected through a pipeline, the water gas collection processing system and the underground air extracting system through a pipeline, micro-nano ozone bubble water preparation system and the enhancer injection system are connected into the underground injection system through a pipeline, and the underground water polluted by hydrochloric ether is processed in situ.A using method of the processing system is provided.The in-situ chemical oxidation repair system and method for underground water polluted by hydrochloric ether are used for repairing underground water polluted by hydrochloric ether, and repair efficiency is greatly improved; the system can be used in a mobile mode, controllers are placed in a container, and automation can be achieved.

Description

technical field [0001] The invention relates to a device for repairing groundwater pollution and a method for using the same. More specifically, the present invention relates to an in-situ chemical oxidation repair system and method for groundwater chlorinated hydrocarbon pollution. Background technique [0002] Chlorinated hydrocarbons are high-efficiency cleaning chemicals widely used in aircraft engines, metal parts, electronic components, and the laundry industry. Due to disorderly discharge and / or leakage of storage facilities, groundwater pollution is common in groundwater. Pollutants, which are not easy to degrade, and have "three causes" effects, the pollution control of chlorinated hydrocarbons in groundwater has attracted widespread attention. Chlorinated hydrocarbons are heavy non-aqueous phase fluids (DNAPL), with high density, low viscosity, and strong underground migration ability. Accumulated in the water layer, become a persistent and harmful source of poll...

Claims

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Application Information

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IPC IPC(8): C02F1/78C02F1/72C02F103/06C02F101/36
CPCC02F1/78C02F1/72C02F2101/36C02F2103/06C02F2201/782C02F2201/784
Inventor 文一王东刘伟江康阳陈坚李璐郜志云井柳新孙宏亮张涛白福高王奕森
Owner CHINESE ACADEMY FOR ENVIRONMENTAL PLANNING
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