A kind of led chip with ito structure and cutting method thereof
A technology of LED chip and cutting method, which is applied in the direction of electrical components, circuits, semiconductor devices, etc., can solve the problems affecting the appearance quality and reliability of AlGaInP-based LED chips, the stress increase of AlGaInP-based LED chips, and the low product qualification rate. Improve appearance quality, good appearance quality, and avoid direct contact
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[0030] The present invention will be described in further detail below in conjunction with the embodiments and with reference to the accompanying drawings.
[0031] like figure 2 As shown, an LED chip with an ITO structure includes a GaAs substrate 100, on which an epitaxial growth buffer layer 101, an n-AlGaInP confinement layer 102, a multi-quantum well active layer 103, p -AlGaInP confinement layer 104 and p-GaP window layer 105, on p-GaP window layer 105, be provided with ITO film layer 106, on ITO film layer 106, be provided with patterned diamond blade cutting aisle 109, on the patterned ITO A metal electrode layer 108 is provided on the thin film layer 106 ; a back electrode 201 is provided under the GaAs substrate 100 .
[0032] A method for cutting an LED chip with an ITO structure, comprising the following steps:
[0033] 1. Preparation of light-emitting diode epitaxial wafers: such as image 3 As shown, a buffer layer 101, an n-AlGaInP confinement layer 102, a m...
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Abstract
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