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Safe, environmental-protection and high-efficiency silicon wafer cleaning agent and preparation method thereof

A safety and environmental protection, silicon wafer technology, applied in the field of cleaning agents, can solve the problems of strong acid or strong alkali can not achieve good cleaning effect, affect work performance, reduce solar energy conversion efficiency and other problems

Inactive Publication Date: 2016-09-21
安庆友仁电子有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in the process of processing, some organic substances are often attached to the surface of the silicon wafer as metal impurities to affect its working performance and reduce the conversion efficiency of solar energy, so the surface of the silicon wafer must be kept clean
Traditional cleaning agents for silicon wafers use strong corrosive chemical reagents such as strong acids or strong alkalis. A single strong acid or strong alkali cannot achieve a good cleaning effect. Therefore, it is urgent to develop a safe, environmentally friendly and efficient silicon wafer cleaning agent. to meet the needs of actual production

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0021] A kind of safe, environment-friendly and efficient silicon wafer cleaning agent proposed by the present invention, its raw material comprises by weight: 6 parts of N-methyl-pyrrolidone, 5 parts of anhydrous sodium carbonate, 6 parts of sodium metasilicate, 6.5 parts of Dynol604 surfactant 4 parts, Surfnol465 surfactant 4 parts, Surfnol104 surfactant 2.5 parts, low foaming surfactant 3.5 parts, fatty alcohol polyoxyethylene ether 2.5 parts, anyylphenol polyoxyethylene 2 parts, dihydroxyethyl-trimethylol 3.5 parts of iminomethane, 2 parts of nitrilotriacetic acid, 3.5 parts of OP-10, 6.5 parts of sodium dodecylbenzenesulfonate, 6 parts of sodium dioctyl succinate sulfonate, 4.5 parts of hexafluoropentanedione, 2.5 parts of β-diketone, 6.5 parts of Tween 80, 3.5 parts of triethanolamine, 3.5 parts of quaternary ammonium base, 3.5 parts of diethylene glycol monomethyl ether, 2.5 parts of ethylene glycol methyl ether, and 15 parts of deionized water.

[0022] The preparation...

Embodiment 2

[0029] The present invention proposes a safe, environmentally friendly and efficient silicon wafer cleaning agent, whose raw materials include by weight: 3 parts of N-methyl-pyrrolidone, 8 parts of anhydrous sodium carbonate, 3 parts of sodium metasilicate, and 8 parts of Dynol604 surfactant 2 parts, Surfnol 465 surfactant 2 parts, Surfnol 104 surfactant 4 parts, low foam surfactant 2 parts, fatty alcohol polyoxyethylene ether 4 parts, anyylphenol polyoxyethylene 1 part, dihydroxyethyl-trimethylol 5 parts of iminomethane, 1 part of nitrilotriacetic acid, 5 parts of OP-10, 4 parts of sodium dodecylbenzenesulfonate, 9 parts of sodium dioctyl succinate sulfonate, 2 parts of hexafluoropentanedione, 4 parts of β-diketone, 4 parts of Tween 80, 5 parts of triethanolamine, 2 parts of quaternary ammonium base, 5 parts of diethylene glycol monomethyl ether, 1 part of ethylene glycol methyl ether, and 20 parts of deionized water.

[0030] The preparation method of a kind of safe, environ...

Embodiment 3

[0037] A kind of safe, environment-friendly and efficient silicon wafer cleaning agent proposed by the present invention, its raw material comprises by weight: 9 parts of N-methyl-pyrrolidone, 2 parts of anhydrous sodium carbonate, 9 parts of sodium metasilicate, 5 parts of Dynol604 surfactant 6 parts of Surfnol 465 surfactant, 1 part of Surfnol 104 surfactant, 5 parts of low-foaming surfactant, 1 part of fatty alcohol polyoxyethylene ether, 3 parts of anyylphenol polyoxyethylene, dihydroxyethyl-trimethylol 2 parts of iminomethane, 3 parts of nitrilotriacetic acid, 2 parts of OP-10, 9 parts of sodium dodecylbenzene sulfonate, 3 parts of sodium dioctyl succinate sulfonate, 7 parts of hexafluoropentanedione, 1 part of β-diketone, 9 parts of Tween 80, 2 parts of triethanolamine, 5 parts of quaternary ammonium base, 2 parts of diethylene glycol monomethyl ether, 4 parts of ethylene glycol methyl ether, and 10 parts of deionized water.

[0038] The preparation method of a kind of s...

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Abstract

The invention discloses a safe, environmental-protection and high-efficiency silicon wafer cleaning agent comprising the raw materials: N-methyl-pyrrolidone, anhydrous sodium carbonate, sodium metasilicate, a Dynol604 surfactant, a Surfnol465 surfactant, a Surfnol104 surfactant, a low-foaming surfactant, fatty alcohol polyoxyethylene ether, nonylphenol polyoxyethylene, dihydroxyethyl-trihydroxymethyl imine methane, nitrilotriacetic acid, OP-10, sodium dodecyl benzene sulfonate, sodium diethylhexyl sulfosuccinate, hexafluoropentanedione, beta-diketone, Twain 80, triethanolamine, quaternary ammonium base, diethylene glycol monomethyl ether, ethylene glycol monomethyl ether and deionized water. The invention also provides a preparation method of the safe, environmental-protection and high-efficiency silicon wafer cleaning agent. The silicon wafer cleaning agent has the advantages of good cleaning effect, high safety, environmental protection and no pollution.

Description

technical field [0001] The invention relates to a cleaning agent, in particular to a safe, environment-friendly and efficient silicon wafer cleaning agent and a preparation method thereof. Background technique [0002] Silicon wafer has good photoelectric effect and is the main material of solar cells. However, in the process of processing, some organic matter often adheres to the surface of the silicon wafer as metal impurities, affecting its working performance and reducing the conversion efficiency of solar energy, so the surface of the silicon wafer must be kept clean. Traditional cleaning agents for silicon wafers use strong corrosive chemical reagents such as strong acids or strong alkalis. A single strong acid or strong alkali cannot achieve a good cleaning effect. Therefore, it is urgent to develop a safe, environmentally friendly and efficient silicon wafer cleaning agent. to meet the needs of actual production. Contents of the invention [0003] In order to sol...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C11D1/83C11D3/08C11D3/10C11D3/20C11D3/24C11D3/28C11D3/30C11D3/33C11D3/44C11D3/60
CPCC11D1/8305C11D1/123C11D1/22C11D1/721C11D3/0047C11D3/08C11D3/10C11D3/2068C11D3/2072C11D3/245C11D3/28C11D3/30C11D3/33C11D3/43
Inventor 项涛项武
Owner 安庆友仁电子有限公司
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