A nanocolumn structure organic field effect transistor memory and its preparation method
A nano-column and organic field technology, which is applied in read-only memory, static memory, semiconductor/solid-state device manufacturing, etc., can solve the problems of low device storage density and stability, high cost of new material development, and decreased device stability. , to achieve faster erasing speed, easy operation, and increased writing speed
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0032] figure 1 The structural schematic diagram of the nanocolumn structure organic field effect transistor memory provided for this embodiment is shown by figure 1 It can be seen that the nanocolumn structure organic field effect transistor memory includes source and drain electrodes, an organic semiconductor layer, a nanocolumn thin film layer, a second-type gate insulating layer, a first-type gate insulating layer, and a certain surface area from top to bottom. thickness of the silicon dioxide substrate.
[0033] It should be noted that the thickness of the nano-column film layer is 15-25 nm, and the material in the nano-column film layer is a macromolecule with high solubility and strong hydrophobicity. Preferably, the macromolecule with high solubility and strong hydrophobicity is a windmill lattice (WG 3 ).
[0034] The second type of gate insulating layer is a hydrophilic polymer, preferably, the above-mentioned hydrophilic polymer material is trimethylolpropane.
...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 


