Aluminum core wire surface silicon plating technology
A technology of wire surface and aluminum core, which is applied in the field of silicon plating on the surface of aluminum core wires, can solve the problems of restricting the application of aluminum core wires, easy oxidation of aluminum core wires, and easy heating of joints, etc., to overcome lattice mismatch and low cost , The effect of less power loss
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Embodiment 1
[0024] 1) Surface pretreatment: Soak the aluminum conductor in the soaking solution for 10 minutes.
[0025] 2), Cleaning and drying: Clean and dry the surface of the aluminum core wire, the drying temperature is 100°C, and the drying time is 20 minutes;
[0026] 3), sputtering: use aluminum source and nitrogen source to sputter a layer of aluminum nitride layer with a thickness of 5um on the surface of aluminum core wire as a buffer layer by vacuum sputtering method;
[0027] 4) Evaporation: pass the aluminum core wire through the vacuum coating tube at a constant speed, set the evaporation temperature to 420°C, and the pressure to 250 Torr, and simultaneously feed the silicon source and hydrogen into the vacuum coating tube, and the hydrogen will reduce the silicon from the silicon source to Monocrystalline silicon is evaporated on the surface of the aluminum core wire, and the thickness of the coating is 10um by controlling the evaporation time;
[0028] 5), annealing: ann...
Embodiment 2
[0030] 1) Surface pretreatment: Soak the aluminum conductor in the soaking solution for 13 minutes.
[0031] 2), Cleaning and drying: Clean and dry the surface of the aluminum core wire, the drying temperature is 130°C, and the drying time is 25 minutes;
[0032] 3) Sputtering: use aluminum source and nitrogen source to sputter a layer of aluminum nitride layer with a thickness of 7um on the surface of the aluminum core wire as a buffer layer by vacuum sputtering method;
[0033] 4) Evaporation: pass the aluminum core wire through the vacuum coating tube at a constant speed, set the evaporation temperature to 430°C, and the pressure to 275Torr, and at the same time feed the silicon source and hydrogen into the vacuum coating tube, and the hydrogen will reduce the silicon from the silicon source to Monocrystalline silicon is evaporated on the surface of the aluminum core wire, and the thickness of the coating is 13um by controlling the evaporation time;
[0034] 5), annealing:...
Embodiment 3
[0036] 1) Surface pretreatment: soak the aluminum conductor in the soaking solution for 15 minutes.
[0037] 2) Cleaning and drying: Clean and dry the surface of the aluminum core wire, the drying temperature is 150°C, and the drying time is 30 minutes;
[0038] 3) Sputtering: use aluminum source and nitrogen source to sputter a layer of aluminum nitride layer with a thickness of 8um on the surface of the aluminum core wire as a buffer layer by vacuum sputtering method;
[0039] 4) Evaporation: pass the aluminum core wire through the vacuum coating tube at a constant speed, set the evaporation temperature to 450°C, and the pressure to 300 Torr, and at the same time feed the silicon source and hydrogen into the vacuum coating tube, and the hydrogen will reduce the silicon from the silicon source to Monocrystalline silicon is evaporated on the surface of the aluminum core wire, and the thickness of the coating is 15um by controlling the evaporation time;
[0040] 5), annealing:...
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