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A perovskite nanostructured plasmonic laser

A plasma and perovskite technology, applied in the fields of micro-nano photonics and lasers, can solve the problems of lack of cavity feedback, high Auger loss, and low quantum efficiency of semiconducting gain media in lasers, and achieve low cavity feedback and Auger loss. The effect of high, high fluorescence yield

Active Publication Date: 2019-01-29
TAIYUAN UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

Although the field strength effect can be improved by using the air gap, the laser also lacks effective cavity feedback and has the problems of low quantum efficiency of the semiconducting gain medium and high Auger loss, so a higher energy pump laser or low temperature ( Working under liquid nitrogen cooling)

Method used

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Embodiment 1

[0015] Evaporate silver with a thickness of 100 nanometers on a flat silicon substrate, and then vapor-deposit silicon dioxide with a thickness of 5 nanometers on the silver surface to form a silver / silicon dioxide composite film; make lead iodide perovskite nanosheets CH 3 NH 3 PB 3 , wherein the lead iodide perovskite nanosheet thickness is 150 nanometers, the cross-sectional shape is a regular hexagon, and the side length of the regular hexagon is 32 microns, and then the lead iodide perovskite nanosheet is moved to the silver / silicon dioxide On the composite film, a silver / silicon dioxide / lead iodide perovskite nanosheet structure is formed. In this structure, the refractive index of silver is 0.14+5.14i, the thickness of silver is 100 nanometers, and the refractive index of silicon dioxide is 1.45 , the thickness is 5 nm, the refractive index of the lead iodide perovskite nanosheet is 2.54+0.03i, the thickness is 150 nm, the cross-sectional shape is a regular hexagon, a...

Embodiment 2

[0017] Evaporate silver with a thickness of 100 nanometers on a silicon substrate with a flat surface, and then vapor-deposit silicon dioxide with a thickness of 10 nanometers on the silver surface to form a silver / silicon dioxide composite film; make lead bromide perovskite nanosheets CH 3 NH 3 PbBr 3 , wherein the lead bromide perovskite nanosheet thickness is 50 nanometers, the cross-sectional shape is a regular hexagon, and the side length of the regular hexagon is 32 microns, and then the lead bromide perovskite nanosheet is moved to the silver / silicon dioxide On the composite film, a silver / silicon dioxide / lead bromide perovskite nanosheet structure is formed. In this structure, the refractive index of silver is 0.14+5.14i, the thickness of silver is 100 nanometers, and the refractive index of silicon dioxide is 1.45 , the thickness is 10 nanometers, the refractive index of the lead bromide perovskite nanosheet is 2.86+0.04i, the thickness is 50 nanometers, the cross-s...

Embodiment 3

[0019] Evaporate aluminum with a thickness of 100 nanometers on a flat sapphire surface, and then vapor-deposit magnesium fluoride with a thickness of 8 nanometers on the silver surface to form an aluminum / magnesium fluoride composite film; make lead chloride perovskite nanosheet CH 3 NH 3 PbCl 3 , wherein the lead chloride perovskite nanosheet thickness is 200 nanometers, the cross-sectional shape is a regular triangle, and the side length of the regular triangle is 48 microns, and then the lead bromide perovskite nanosheet is moved to the aluminum / magnesium fluoride On the composite film, an aluminum / magnesium fluoride / lead chloride perovskite nanosheet structure is formed. In this structure, the refractive index of aluminum is 1.48+3.14i, and the thickness is 100 nanometers. The refractive index of magnesium fluoride is 1.38, and the thickness The lead chloride perovskite nanosheet has a refractive index of 3.06+0.04i, a thickness of 200 nanometers, a regular triangle in c...

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Abstract

The invention belongs to the technical field of micro-nano photons and laser, and particularly relates to a perovskite nano-structure plasma laser. A lead halide perovskite plasma laser comprises a lead halide perovskite nanosheet, an insulating dielectric layer and a metal substrate; the lead halide perovskite nanosheet, which is of a regular polygon structure, is located above the metal substrate; the insulating dielectric layer is located between the lead halide perovskite nanosheet and the metal substrate; and the ratio of the refractive indexes of the insulating dielectric layer and the lead halide perovskite nanosheet is less than 0.75. The perovskite nano-structure plasma laser has the characteristics of effective cavity feedback, low threshold value and adjustable wavelength.

Description

technical field [0001] The invention belongs to the technical field of micro-nano photons and lasers, in particular to a perovskite nanostructure plasma laser. Background technique [0002] In the past few decades, laser science has achieved great success in making taller, faster, smaller coherent light sources. Similar to electronic devices, the miniaturization and integration of photonic devices has broad application prospects. Ultra-small lasers can be used in the fields of chemical and biomedical engineering, such as high-sensitivity detection of chemical substances, high-sensitivity and small-volume biosensors, microscopy, and laser surgery. In addition, ultra-small lasers are also widely used in the fields of all-optical computing, optical storage, and nanoanalysis. [0003] Laser resonators based on traditional dielectric materials are limited by the diffraction limit, and their spot size cannot be smaller than half of the light wavelength. This long-standing hurdl...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01S5/20H01S5/30
CPCH01S5/20H01S5/30
Inventor 李国辉崔艳霞纪兴启
Owner TAIYUAN UNIV OF TECH
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