Surface blackening treatment method for rolled copper foil
A technology for rolling copper foil and a treatment method, which is applied in the field of surface treatment of rolled copper foil, can solve the problems that the appearance color, peeling resistance, etching property, and solderability cannot meet the requirements of PDP production, and achieve good matting effect, good The effect of acid resistance
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Embodiment 1
[0051] The black surface treatment process of rolled copper foil includes the following steps in sequence:
[0052] Electrochemical degreasing, water washing, electrochemical degreasing, water washing, electrochemical degreasing, water washing, pickling, water washing, roughening treatment, water washing, secondary roughening treatment, water washing, curing treatment, water washing, secondary curing treatment, Water washing, nickel-cobalt plating, water washing, galvanizing, water washing, passivation, water washing, coating with silane coupling agent, drying, winding and off-line.
[0053] in:
[0054] The electrochemical degreasing solution used is sodium hydroxide aqueous solution, in which OH - The concentration is 35g / L, the temperature is normal temperature, and the current density of electrochemical degreasing is 3A / dm 2 ;
[0055] The pickling solution used is sulfuric acid, where H + The concentration is 30g / L, and the temperature is normal temperature;
[0056]...
Embodiment 2
[0069] Compared with Embodiment 1, this embodiment differs from:
[0070] The electrochemical degreasing solution used is sodium hydroxide aqueous solution, in which OH - The concentration is 40g / L, the temperature is normal temperature, and the current density of electrochemical degreasing is 4A / dm 2 ;
[0071] The pickling solution used in is sulfuric acid, where H + The concentration is 35g / L, and the temperature is normal temperature;
[0072] The primary roughening solution used, where Cu 2+ 26g / L, H 2 SO 4 125g / L, temperature is 30℃, current density is 18A / dm 2 ;
[0073] The secondary roughening solution used, where Cu 2+ 36g / L, H 2 SO 4 135g / L, temperature is 30℃, current density is 38A / dm 2 ;
[0074] The primary curing solution used, where Cu 2+ 36g / L, H 2 SO 4 95g / L, temperature is 40℃, current density is 17A / dm 2 ;
[0075] The secondary curing solution used, where Cu 2+ 40g / L, H 2 SO 4 95g / L, temperature is 40℃, current density is 10A / dm 2...
Embodiment 3
[0084] Compared with Embodiment 2, the present embodiment differs from:
[0085] The degreasing solution used is sodium hydroxide aqueous solution, in which OH - The concentration is 45g / L, the temperature is normal temperature, and the current density of electrochemical degreasing is 5A / dm 2 ;
[0086] The pickling solution used is sulfuric acid, where H + The concentration is 40g / L, and the temperature is normal temperature;
[0087] The primary roughening solution used, where Cu 2+ 26g / L, H 2 SO 4 120g / L, temperature is 30℃, current density is 16A / dm 2 ;
[0088] The secondary roughening solution used, where Cu 2+ 34g / L, H 2 SO 4 130g / L, temperature is 30℃, current density is 37A / dm 2 ;
[0089] The primary curing solution used, where Cu 2+ 40g / L, H 2 SO 4 90g / L, temperature is 40℃, current density is 16.2A / dm 2 ;
[0090] The secondary curing solution used, where Cu 2+35g / L,H 2 SO 4 90g / L, temperature is 40℃, current density is 9.4A / dm 2 ;
[0091...
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