Method for preparing individualized porous implant by photocuring and electrolytic reduction

An implant and light-curing technology, which is applied in the fields of pharmaceutical formulation, drug delivery, medical science, etc., can solve the problems of inability to form nanostructures and uncontrollable microscopic bionic structures, and achieve the effect of improving biocompatibility and benefiting cell activities

Active Publication Date: 2017-02-01
XI AN JIAOTONG UNIV
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AI Technical Summary

Problems solved by technology

[0004] In order to overcome the uncontrollable microscopic bionic structure of porous implants and the inability to form nanostructures, the purpose of the present invention is to provide a personalized porous implant with micro-nano structure prepared by photocuring and electrolytic reduction of metal oxide ceramics. The method, which combines the additive manufacturing method, the elec

Method used

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Embodiment

[0045] A method for preparing personalized porous implants by photocuring forming and electrolytic reduction, including four steps of personalized macro-micro integrated design, photocuring forming, molten salt electrolytic reduction and chemical vapor enhancement:

[0046] Take Ta 2 o 5 The preparation of personalized porous tantalum implants with micro-nano structures by photocuring and electrolytic reduction is an example. Firstly, a personalized porous tantalum implant model with microstructure is designed using three-dimensional software according to the physiological size, internal environment characteristics and lesion condition of the diseased tissue of the clinical patient. Then prepare Ta 2 o 5 The mixed slurry of spherical powder and commercial resin, organic monomer, crosslinking agent, diluent, photoinitiator and dispersant, using the prepared mixed slurry to prepare Ta 2 o 5 Porous implants, high temperature sintering to remove impurities. Ta 2 o 5 The po...

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Abstract

The invention provides a method for preparing an individualized porous implant by photocuring and electrolytic reduction. The method comprises the following steps: designing the microstructure individualized porous implant by using a medical image data reverse model according to the physical features of the implanted position; preparing a photocuring slurry from metal oxide ceramic spherical powder, a commercial resin, an organic monomer, a crosslinking agent, a diluter, a photoinitiator and a dispersing agent; preparing a primary metal oxide ceramic porous implant by a photocuring additive manufacturing process, and carrying out high-temperature sintering to remove impurities; manufacturing a primary porous metal implant by chloride fused salt in-situ reduction; and depositing a metal coating on the surface of the primary porous metal implant by chemical vapor deposition. The method overcomes the defects of uncontrollable microstructure and high difficulty in direct laser additive manufacturing in the traditional porous implant preparation process, can implement the nano structure, and is hopeful to open up a new way for preparing the porous implant.

Description

technical field [0001] The invention relates to a method for preparing a personalized porous implant by photocuring and electrolytic reduction. The method belongs to the field of biological additive manufacturing (3D printing) and can be applied to the field of biomedicine. Background technique [0002] Additive manufacturing has important applications in the medical field, especially for the manufacture of personalized implants, which has unparalleled advantages and a potential market of tens of billions in the future. At present, implants manufactured by direct metal forming of various metal materials such as stainless steel, titanium alloy and cobalt-based alloy have been widely used in heart valve stents, vascular stents, digestive tract stents, bone repair and replacement stents and other stents clinically, and achieved better therapeutic effect. However, the complex environment in the human body will cause material corrosion and release of toxic elements, resulting in...

Claims

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Application Information

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IPC IPC(8): A61L27/30A61L27/06A61L27/04A61L27/56A61L31/08A61L31/02A61L31/14
CPCA61L27/047A61L27/06A61L27/306A61L27/56A61L31/022A61L31/088A61L31/146A61L2400/12
Inventor 刘亚雄赵广宾黄亚江伍言龙陈旭安超李涤尘贺健康王玲连芩
Owner XI AN JIAOTONG UNIV
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