Preparation method of high-toughness polylactic acid membrane
A technology of polylactic acid and high toughness, which is applied in the field of preparation of high toughness polylactic acid film, can solve the problems of brittle fracture, low crystallinity and poor toughness of polylactic acid film, and achieve high crystallinity, good toughness, and preparation steps simple effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
example 1
[0015] First, weigh 20g of montmorillonite, put it in a mortar and grind it through a 200-mesh sieve. Add the sieved montmorillonite powder and 6.2g of cetyltrimethylammonium bromide to 500mL of deionized water. Stir at 500r / min and heat to 80°C for 1h, then filter, wash the filter residue with deionized water 3 times, then place the filter residue in a vacuum drying oven and dry at 90°C for 8h to obtain organically modified montmorillonite. Standby; Weigh 5.4g nanocrystalline cellulose, 3.6g paraformaldehyde, add 160mL dimethyl sulfoxide, stir at 300r / min for 20min under a constant temperature water bath at 105℃, then add 54mL tert-amyl alcohol, 3.5 g glyceride hydrolase, 6.0g vinyl propionate, 3.6g vinyl laurate, stirred at 180r / min for 8h under a constant temperature water bath at 40℃, then transferred to a centrifuge, centrifuged at 8000r / min for 3min, and collected Precipitate, wash the precipitate twice with absolute ethanol, then place the precipitate in a vacuum drying ...
example 2
[0017] First, weigh 22g of montmorillonite, put it in a mortar and grind it through a 200-mesh sieve. Add the sieved montmorillonite powder and 6.8g cetyltrimethylammonium bromide to 550mL of deionized water. Stir at 550r / min and heat to 85°C for 2h, then filter, wash the filter residue with deionized water 4 times, then place the filter residue in a vacuum drying oven and dry at 95°C for 9h to obtain organically modified montmorillonite. Standby; Weigh 5.7g nanocrystalline cellulose, 3.8g paraformaldehyde, add 170mL dimethyl sulfoxide, stir at 350r / min for 25min under a constant temperature water bath at 108℃, then add 57mL tert-amyl alcohol, 3.7 g glyceride hydrolase, 6.8g vinyl propionate, 3.8g vinyl laurate, stirred at 190r / min for 9h under a constant temperature water bath at 45℃, then transferred to a centrifuge, centrifuged at 10000r / min for 4min, and collected Precipitate, wash the precipitate 3 times with absolute ethanol, then place the precipitate in a vacuum drying ...
example 3
[0019] First, weigh 24g of montmorillonite, put it in a mortar and grind it through a 200-mesh sieve. Add the sieved montmorillonite powder and 7.5g of cetyltrimethylammonium bromide to 600mL of deionized water. Stir at 600r / min and heat to 90°C for 2h, then filter, wash the filter residue with deionized water 5 times, then place the filter residue in a vacuum drying oven and dry at 100°C for 10h to obtain organically modified montmorillonite. Standby; Weigh 6.0g nanocrystalline cellulose, 4.0g paraformaldehyde, add 180mL dimethyl sulfoxide, stir at 400r / min for 30min under a constant temperature water bath at 110℃, and then add 60mL tert-amyl alcohol, 3.9 g glyceride hydrolase, 7.5g vinyl propionate, 4.0g vinyl laurate, stirred at 200r / min for 10h under a constant temperature water bath at 50℃, then transferred to a centrifuge, centrifuged at 12000r / min for 5min, and collected Precipitate, wash the precipitate 3 times with absolute ethanol, then place the precipitate in a vacu...
PUM
Property | Measurement | Unit |
---|---|---|
tensile strength | aaaaa | aaaaa |
elastic modulus | aaaaa | aaaaa |
tensile strength | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com