Blue-light-cutoff and anti-reflexion dual-function coated glass and preparation method therefor
A technology of coated glass and anti-reflection film, which is applied in the field of blue light-cutting and anti-reflection dual-function coated glass and its preparation, can solve problems such as visual fatigue and unclear images, reduce fatigue, prevent human eye damage, and have a simple preparation process Effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
preparation example Construction
[0063] The preparation method of the blue light cutoff and visible light antireflection bifunctional coated glass comprises the following steps:
[0064] The glass substrate to be coated is cleaned and dried with deionized water to obtain a clean sample; the clean glass is placed in a vacuum box for sputtering coating, and the glass surface is treated with a plasma formed by a voltage of 500-1000V under normal pressure nitrogen. ; Then pump the air pressure of the vacuum box to 3.5~8.5×10 -4 Pa. The thickness of the blue cut-off film is 110nm-326nm, and the thickness of the visible light anti-reflection film is 170nm-330nm.
Embodiment 1
[0066] 1. Coating the cut-off blue light film on one side of the glass in turn
[0067] 1. Plating SiOx film layer: in the vacuum box, the flow rate of oxygen and argon is 5-15%, and the sputtering pressure is 2.5-4.5×10 -1 Pa, pure silicon or silicon boron is used as the target, and the thickness of the deposited silicon oxide film is 5nm.
[0068] 2. Coating cut-off blue light film (amorphous silicon): In the vacuum box, argon is used as the working gas, and the sputtering pressure is 2.5 ~ 4.5 × 10 -1 Pa, pure silicon or silicon boron is used as the target material, and the thickness of the deposited film is 70nm.
[0069] Or plating cut-off blue light film (tungsten oxide): in the vacuum box, the flow ratio of oxygen and argon is 15-25%, and the sputtering pressure is 2.5-4.5×10 -1 Pa, using pure metal tungsten or tungsten oxide as the target, the thickness of the deposited tungsten oxide film is 70nm
[0070] 3. Plating SiOx film layer: in the vacuum box, the flow rati...
Embodiment 2
[0080] 1. Coating the blue light cut-off film on one side of the glass in turn
[0081] 1. Plating SiOx film layer: in the vacuum box, the flow rate of oxygen and argon is 5-15%, and the sputtering pressure is 2.5-4.5×10 -1 Pa, using pure silicon, or silicon boron as the target, the thickness of the deposited silicon oxide film is 25nm.
[0082] 2. Coating cut-off blue light film (amorphous silicon): In the vacuum box, argon is used as the working gas, and the sputtering pressure is 2.5 ~ 4.5 × 10 -1 Pa, using pure silicon or silicon boron as the target, the thickness of the deposited film is 80nm.
[0083] Or plating cut-off blue light film (tungsten oxide): in the vacuum box, the flow ratio of oxygen and argon is 15-25%, and the sputtering pressure is 2.5-4.5×10 -1 Pa, using pure metal tungsten or tungsten oxide as the target, the thickness of the deposited tungsten oxide film is 80nm
[0084] 3. Coating silicon oxynitride film: in the vacuum box, the flow ratio of oxygen...
PUM
Property | Measurement | Unit |
---|---|---|
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com