Method for producing micro-needle array templates based on laser etching technology as well as products and application thereof
A microneedle array and laser etching technology, which is applied in laser welding equipment, surgery, manufacturing tools, etc., can solve the difficulties in mass production and application of microneedle array templates, complicated preparation process of microneedle array templates, poor structural design, etc. problem, to improve the effect of transdermal treatment, improve skin permeability, and easy to cure and form.
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[0038] The method for preparing the microneedle array template provided by the laser etching technology generally includes the following steps:
[0039] (1) Preparation of PDMS substrate: Put PDMS and its curing agent (such as SYLGARD 184) in a plastic petri dish at a mass ratio of 20:1 to 5:1, and stir and mix thoroughly. The mass ratio can be preferably 10:1. Vacuum at 0.08MPa to remove bubbles in the mixture, heat and solidify at 70-90°C for 1 to 4 hours (also preferably heat and solidify at 80°C for 2 hours), and peel off after cooling;
[0040] (2) The design of the laser etching mask: use the engraving machine drawing software to draw a 10×10 concentric array with a diameter of 50 to 500 μm and a pitch of 200 to 600 μm; the diameter can be preferably 50 to 300 μm, more preferably 50 to 250μm, the pitch can be preferably 300~500μm;
[0041] (3) Etching of microneedle template: Place the PDMS substrate obtained in step (1) horizontally on PL-40 CO 2 In the engraving area of th...
Example Embodiment
[0044] Example 1
[0045] The microneedle array template prepared based on laser etching technology in this embodiment is prepared according to the following method:
[0046] (1) Preparation of PDMS substrate: Put PDMS and its curing agent (such as SYLGARD 184) in a plastic petri dish at a mass ratio of 10:1, fully stir and mix, and vacuum at -0.08MPa to remove bubbles in the mixture. Heat and solidify at ℃ for 2h, then peel off after cooling to obtain the PDMS substrate required for laser etching;
[0047] (2) The design of the laser etching mask: use the drawing software of the engraving machine to draw a 10×10 concentric circle array with a diameter of 150μm and a spacing of 500μm; take any concentric circle in the concentric circle array as an example, the diameter here refers to The diameter corresponding to the circle with the largest diameter, and the diameter of the circle with the smallest diameter among the concentric circles may be 50 μm.
[0048] (3) Etching of microneedl...
Example Embodiment
[0050] Example 2
[0051] The microneedle array template prepared based on laser etching technology in this embodiment is prepared according to the following method:
[0052] (1) Preparation of PDMS substrate: Place PDMS and its curing agent in a plastic petri dish at a mass ratio of 10:1, fully stir and mix, vacuum at -0.08MPa to remove bubbles in the mixture, heat and cure at 80°C for 2h, After cooling, peel off to obtain the PDMS substrate required for laser etching;
[0053] (2) Laser etching mask design: draw a 10×10 concentric circle array with a diameter of 150μm and a spacing of 500μm with the drawing software of the engraving machine;
[0054] (3) Etching of microneedle array template: Place the PDMS substrate obtained in (1) horizontally on PL-40 CO 2 In the engraving area of the laser engraving machine, import the mask pattern obtained in (2) into the laser etching software, set the laser current to 6mA, the laser scanning rate to 10cm / s and the laser processing times to ...
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